Surface characterization of 3-glycidoxypropyltrimethoxysilane films on silicon-based substrates.

摘要

This work involved the characterization of covalently-attached 3-glycidoxypropyltrimethoxysilane (GOPS) on silicon-based substrates such as silicon wafers and glass for the development of optical DNA biosensors. Surface-sensitive techniques including angularly-dependent X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS), atomic force microscopy (AFM), scanning electron microscopy (SEM), and single-wavelength and spectroscopic ellipsometry were used to determine surface morphology, film thickness, and chemical composition. XPS and ToF-SIMS provided chemical evidence of GOPS and indicated a uniform spatial distribution of GOPS. AFM and SEM data suggested the presence of a film that consisted of nodules. Angularly-resolved XPS and both ellipsometry techniques produced thickness values of the GOPS film indicative of a monolayer film. Based on these results, the GOPS film was characterized to be a uniform monolayer with nodules. It is speculated that these nodules may provide insight into the behaviour of DNA hybridization kinetics and thermodynamics on GOPS-derivatized silicon-based substrates.