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A Numerical Model of Anisotropic Mass Transport Through Grain Boundary Networks.

机译:晶粒边界网络各向异性传质的数值模型。

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摘要

Tin (Sn) thin films are commonly used in electronic circuit applications as coatings on contacts and solders for joining components. It is widely observed, for some such system, that whiskers---long, thin crystalline structures---emerge and grow from the film. The Sn whisker phenomenon has become a highly active research area since Sn whiskers have caused a large amount of damage and loss in manufacturing, military, medical and power industries. Though lead (Pb) addition to Sn has been used to solve this problem for over five decades, the adverse environmental and health effects of Pb have motivated legislation to severely constrain Pb use in society. People are researching and seeking the reasons which cause whiskers and corresponding methods to solve the problem. The contributing factors to cause a Sn whisker are potentially many and much still remains unknown. Better understanding of fundamental driving forces should point toward strategies to improve (a) the accuracy with which we can predict whisker formation, and (b) our ability to mitigate the phenomenon.;This thesis summarizes recent important research achievements in understanding Sn whisker formation and growth, both experimentally and theoretically. Focus is then placed on examining the role that anisotropy in grain boundary diffusivity plays in determining whisker characteristics (specifically, whether they form and, if so, where on a surface). To study this aspect of the problem and to enable future studies on stress driven grain boundary diffusion, this thesis presents a numerical anisotropic mass transport model. In addition to presenting details of the model and implementation, model predictions for a set of increasingly complex grain boundary networks are discussed. Preliminary results from the model provide evidence that anisotropic grain boundary diffusion may be a primary driving mechanism in whisker formation.
机译:锡(Sn)薄膜通常用于电子电路应用中,作为触点上的涂层和用于连接组件的焊料。对于某些这样的系统,人们普遍观察到晶须-长而薄的晶体结构-从薄膜中出现并生长。由于锡晶须在制造,军事,医疗和电力行业中造成了大量的破坏和损失,因此锡晶须现象已成为一个非常活跃的研究领域。尽管将锡中的铅(Pb)用来解决该问题已有五十多年了,但是Pb对环境和健康的不利影响促使立法严重限制了Pb在社会中的使用。人们正在研究并寻找引起晶须的原因以及解决该问题的相应方法。导致锡晶须的成因因素可能很多,很多仍然未知。对基本驱动力的更好理解应该指向提高(a)我们可以预测晶须形成的准确性和(b)我们减轻晶须现象的能力的策略。;本文总结了最近在理解Sn晶须形成和形成方面的重要研究成果。在实验和理论上都有增长。然后将重点放在研究各向异性在晶界扩散率中在确定晶须特性(具体来说,是否形成晶须,以及是否在表面上的位置)中发挥作用。为了研究该问题的这一方面,并​​使将来在应力驱动的晶界扩散方面的研究成为可能,本文提出了一种数值各向异性的传质模型。除了介绍模型和实现的细节外,还讨论了一组越来越复杂的晶粒边界网络的模型预测。该模型的初步结果提供了证据,各向异性晶界扩散可能是晶须形成的主要驱动机制。

著录项

  • 作者

    Wang, Yibo.;

  • 作者单位

    Lehigh University.;

  • 授予单位 Lehigh University.;
  • 学科 Engineering Mechanical.;Engineering Materials Science.;Physics Condensed Matter.
  • 学位 M.S.
  • 年度 2011
  • 页码 100 p.
  • 总页数 100
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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