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STM- and DFT-study of gadolinium disilicide nanowires on the silicon(001) surface.

机译:硅(001)表面上的二硅化icide纳米线的STM和DFT研究。

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This dissertation provides a description of our studies involving self-assembled GdSi2 nanostructures on Si(001). This study is motivated by interests in utilizing bottom-up fabrication techniques to produce one-dimensional structures compatible with existing silicon technology for the development of nanoscale interconnect systems and novel electronic devices. Although previous investigations of rare earth disilicides on Si(001) systems have provided information on the periodicity of the wetting layer reconstructions and the morphology of nanowires, absent from these reports were detailed information about the structure of the wetting layer, growth mechanism of the overlayer and a quantitative measure of the conductivity of the wires.; Through scanning tunneling microscopy observations, we have identified a variety of reaction products that are produced on the Si(100) surface as a function of the Gd metal coverage and annealing temperature. At very low coverages, the metal produces LLDs in the silicon surface. When additional metal is added a variety of surface features are observed, which mark the beginning of wetting layer formation. Further increase in metal coverage leads to the completion of the wetting layer, which can appear as a 2 x 8 and a 2 x 7 reconstruction. A c(4 x 4) reconstruction has also been identified under sample preparation conditions; however, this reconstruction does not contain Gd metal. With increased coverage and temperature an intermediate growth regime is reached where highly anisotropic islands are formed. These metastable elongated islands, or nanowires, were found to be composed of either hexagonal or orthorhombic silicide. At higher temperatures a second growth regime is reached where only three dimensional islands with an orthorhombic crystal structure are formed.; The features of each regime were investigated to identify their structure and role in the formation of nanowires. Structures were determined from scanning tunneling microscopy images both at room temperature and at wire growth temperatures and through density functional theory calculations. Additionally, the electronic properties of hexagonal silicide nanowires were investigated by scanning tunneling spectroscopy in vacuum and conductive atomic force microscopy under ambient conditions.
机译:本文为我们关于Si(001)上自组装GdSi2纳米结构的研究提供了描述。这项研究的兴趣在于利用自下而上的制造技术来生产与现有硅技术兼容的一维结构,以开发纳米级互连系统和新型电子设备。尽管先前对Si(001)系统上的稀土二硅化物的研究提供了有关润湿层重建的周期性和纳米线形态的信息,但这些报告中缺少有关润湿层结构,覆盖层生长机理的详细信息以及定量测量导线的电导率。通过扫描隧道显微镜观察,我们已经确定了在Si(100)表面上生成的各种反应产物,这些产物是Gd金属覆盖率和退火温度的函数。在极低的覆盖率下,金属会在硅表面产生LLD。当添加其他金属时,观察到各种表面特征,这标志着润湿层形成的开始。金属覆盖率的进一步提高导致润湿层的完成,这可以表现为2 x 8和2 x 7的重建。在样品制备条件下,还确定了c(4 x 4)重建;然而,这种重建不包含G金属。随着覆盖率和温度的增加,达到了中间生长机制,形成了高度各向异性的岛。发现这些亚稳态的细长岛或纳米线由六角形或正交硅化物组成。在较高的温度下达到第二生长方式,其中仅形成具有正交晶体结构的三维岛。研究了每个方案的特征,以识别其结构和在纳米线形成中的作用。通过在室温和线生长温度下通过扫描隧道显微镜图像并通过密度泛函理论计算来确定结构。此外,在环境条件下,通过真空和导电原子力显微镜中的扫描隧道光谱研究了六角形硅化物纳米线的电子性能。

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