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The effects of temperature slip on the modeling of systems with heterogeneous and homogeneous reactions.

机译:温度滑移对具有均相和均相反应的系统建模的影响。

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In this research project, the effects of temperature slip are investigated in systems of low-pressure chemical vapor deposition (LPCVD), combustion synthesis, and catalytic combustion. The relations for the estimation of temperature slip are reviewed, and the influences of temperature slip on the concentrations of key species and on the growth or conversion rate are discussed. A two-temperature model is proposed to investigate the effects of temperature slip in these systems. The results suggest that neglecting temperature slip in modeling these systems can lead to an over or under-prediction of the results if a significant temperature slip is present and either gas-phase reactions or any gas-surface reaction with a large kinetic energy dependence play important roles in such systems. Three CVD systems (silicon, silicon carbide, and gallium arsenide), for which explicit gas-phase and surface mechanisms exist, are investigated to study the influence of neglecting the temperature slip on growth rates. In addition, studies on diamond film deposition and catalytic combustion are computationally investigated. The importance of accurate values of kinetic-energy dependent gas-surface reaction rates is noted as a critical factor in the accurate evaluation of the effects of temperature slip in some important systems (e.g. methane catalytic combustion). Further modeling studies on catalytic combustion systems are combined with other experimental data to validate our proposed two-temperature approach. Also, a theoretical analysis of the effects of temperature slip is performed to study the influences and relative importance of different system parameters, such as temperature slip magnitude, ratios of sticking coefficients, activation energy and other parameters. Three approaches are used in this theoretical analysis. Finally, a detailed sensitivity analysis is used to identify the important reactions and key parameters in systems of engineering relevance, as well as the effects of variations of parameters. The techniques in this study can also be used for other low-pressure or small scale systems with heterogeneous and homogeneous reactions.
机译:在此研究项目中,在低压化学气相沉积(LPCVD),燃烧合成和催化燃烧系统中研究了温度滑移的影响。回顾了温度滑移估计的关系,讨论了温度滑移对关键物种浓度和生长或转化率的影响。提出了两个温度模型来研究这些系统中温度滑移的影响。结果表明,如果存在显着的温度滑移,而气相反应或任何具有较大动能依赖性的气相表面反应都起着重要作用,则在对这些系统进行建模时忽略温度滑移会导致结果的过高或过低预测。在此类系统中的角色。研究了三种具有明显气相和表面机理的CVD系统(硅,碳化硅和砷化镓),以研究忽略温度滑移对生长速率的影响。此外,还对金刚石膜沉积和催化燃烧的研究进行了计算研究。在某些重要系统(例如甲烷催化燃烧)中,准确评估动能相关气体表面反应速率的准确值的重要性是准确评估温度滑移影响的关键因素。对催化燃烧系统的进一步建模研究与其他实验数据相结合,以验证我们提出的双温方法。此外,对温度滑移的影响进行了理论分析,以研究不同系统参数(例如温度滑移量,粘着系数之比,活化能和其他参数)的影响和相对重要性。在此理论分析中使用了三种方法。最后,使用详细的灵敏度分析来确定工程相关系统中的重要反应和关键参数,以及参数变化的影响。本研究中的技术还可以用于具有均相和均相反应的其他低压或小规模系统。

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