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Graphene Interface Engineering: Surface/Substrate Modifications cum Metal Contact Exploration.

机译:石墨烯界面工程:表面/基材修饰暨金属接触探索。

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摘要

Graphene is an appealing material in both science and technology. Its distinct electronic, thermal and mechanical properties have stimulated enormous scientific interest. In particular, graphene-based field-effect transistors (GFET) have been developed rapidly and are now considered an option for post-silicon electronics. In contrast to traditional semiconductors, the unique two dimensional structure of graphene offers the possibility of studying the interface characteristics for its proximity to the top surface and interface between graphene and the outside environment. We are thus interested in understanding graphene surface and interfacial issues associated with electronic structure, carrier transport and related phenomena on a nano-scale. In this thesis, we investigate both experimentally and theoretically the mechanisms of graphene interfacial couplings to different substrates, charge injection from metal electrodes and its interplay with inert adsorbates.;At first, few layer graphene's (FLG) electronic properties are adjusted efficiently and controllably through functionalizing its top surface. Both n-type and p-type doped exfoliated graphene sheets are present by virtue of adsorbing organic molecules. Additionally, the doping effects induced by electron beam (EB) irradiation are also studied. We find that by irradiating graphene with EB, graphene p-n junctions can be formed if EB irradiation is applied across a single graphene sheet containing regions with different layers.;Secondly, the crucial roles played by the supported substrate in graphene applications are meticulously interrogated. The existence of charge impurities and ripples adversely affects the mobility of high quality mechanically exfoliated graphene on commercially available SiO2/Si wafers inferior to its theoretical limit. To suppress the deleterious substrate effect, we utilize self-assembled monolayers to passivate the SiO2/Si substrate surface. After diminishing the unwanted scattering origins by this method, an increase in carrier mobility by nearly one order of magnitude (up to 47,000 cm 2/Vs) is obtained.;Furthermore, the electronic properties of the interfaces between graphene and various metal electrodes are systematically investigated. Our study unambiguously reveals that a low electrical resistance as well as a linear current-voltage relation is not always granted for GFETs. Interestingly, for graphene on SiO 2/Si passivated with highly-ordered OTMS, both 'space charge region limited' and 'ohmic' contacts can be obtained with a single metal electrode. We also find that by utilizing voltage bias, the contact can be reversibly altered between high resistance and low resistance. We ascribe the phenomenon to graphene's cone energy dispersion relationship as well as the vanishing density of states at the Dirac points. Our results herald a new avenue for achieving high density non-volatile graphene memory devices.
机译:石墨烯是科学和技术领域中有吸引力的材料。其独特的电子,热和机械性能激发了巨大的科学兴趣。特别是,基于石墨烯的场效应晶体管(GFET)已得到迅速发展,现在被认为是后硅电子产品的一种选择。与传统半导体相比,石墨烯独特的二维结构为研究其与顶表面的接近以及石墨烯与外部环境之间的界面的界面特性提供了可能性。因此,我们有兴趣了解与石墨烯表面和与电子结构,载流子传输和纳米级相关现象有关的界面问题。本文从理论和实验两方面研究了石墨烯与不同基底的界面偶联机理,金属电极的电荷注入及其与惰性吸附剂的相互作用。首先,通过控制有效地调节了几层石墨烯的电子性能。功能化其顶面。由于吸附有机分子,n型和p型掺杂的脱落石墨烯片都存在。此外,还研究了由电子束(EB)辐射引起的掺杂效应。我们发现通过用EB辐照石墨烯,如果将EB辐照施加在包含具有不同层的区域的单个石墨烯片上,则可以形成石墨烯p-n结;其次,仔细研究了支撑衬底在石墨烯应用中所起的关键作用。电荷杂质和波纹的存在不利地影响了质量低于其理论极限的商购SiO2 / Si晶片上高质量机械剥离石墨烯的迁移率。为了抑制有害的衬底效应,我们利用自组装单层钝化SiO2 / Si衬底表面。通过这种方法减少了不必要的散射源之后,载流子迁移率提高了近一个数量级(高达47,000 cm 2 / Vs)。此外,系统地研究了石墨烯与各种金属电极之间界面的电子特性调查。我们的研究清楚地表明,GFET并不总是具有低电阻以及线性电流-电压关系。有趣的是,对于用高阶OTMS钝化的SiO 2 / Si上的石墨烯,可以通过单个金属电极获得“空间电荷区域受限”和“欧姆”接触。我们还发现通过利用电压偏置,可以在高电阻和低电阻之间可逆地改变接触。我们将这种现象归因于石墨烯的锥体能量色散关系以及狄拉克点处的消失状态。我们的结果预示着实现高密度非易失性石墨烯存储器件的新途径。

著录项

  • 作者

    Wang, Xiaomu.;

  • 作者单位

    The Chinese University of Hong Kong (Hong Kong).;

  • 授予单位 The Chinese University of Hong Kong (Hong Kong).;
  • 学科 Engineering Electronics and Electrical.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 203 p.
  • 总页数 203
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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