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Bulk crystal growth process for compositionally homogeneous gallium indium antimonide substrates.

机译:组成均匀的镓铟锑化物基质的块状晶体生长工艺。

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摘要

The mode of redistributing the excess solute species at the melt-solid interface accumulated during the growth of bulk ternary semiconductor crystals is a key factor determining the spatial alloy composition and crystalline quality. Since the solidification temperatures vary with alloy composition, a control over both heat and mass transport during crystal growth is necessary for achieving spatial compositional homogeneity in the grown crystals. The goal of this work has to been to identify growth conditions necessary for compositionally homogeneous (within 1 mol% in the radial direction) substrates.; A comparative study of various melt stirring schemes with different axial temperature gradients and the resulting alloy distribution in the crystals has been presented in this thesis. A combination of axial thermal gradient of approximately 15°C/cm, accelerated crucible rotation (ACRT) with maximum crucible acceleration up to 100 rpm in 60 seconds and growth rate in the range of 0.2--0.5 mm/hr has been found to be most suitable for radially homogeneous Ga1-xInxSb crystals. Bulk polycrystals of 50 mm diameter Ga1-xInxSb across the entire composition range (x = 0--1) has been successfully grown under these conditions.; The below bandgap infrared transmission (up to 25 mum) in undoped Ga 1-xInxSb bulk crystals has been studied for the first time and found to be limited by native defects such as anti-sites and vacancies found in antimonide based III-V compounds. For the gallium rich alloy compositions (x 0.5 in Ga1-xInxSb), the crystals exhibit p-type conductive behavior with increase in net acceptor concentration with increase in gallium content in the crystals. For x > 0.5 (the indium rich alloy compositions), the crystals exhibit n-type conductivity with increase in net donor concentration with increase in indium content in the crystals. (Abstract shortened by UMI.)
机译:在块状三元半导体晶体的生长过程中,在熔体-固相界面上积累的多余溶质物种发生再分布的方式是决定空间合金成分和晶体质量的关键因素。由于凝固温度随合金成分的变化而变化,因此在晶体生长过程中必须同时控制热量和质量传递,以在生长的晶体中实现空间成分的均匀性。这项工作的目标是确定成分均匀(在径向上不超过1摩尔%)的基材所必需的生长条件。本文对具有不同轴向温度梯度的各种熔体搅拌方案及其在晶体中的合金分布进行了比较研究。已经发现轴向热梯度约为15°C / cm,加速坩埚旋转(ACRT)和在60秒内最大坩埚加速度高达100 rpm,生长速率在0.2--0.5 mm / hr的组合最适用于径向均匀的Ga1-xInxSb晶体。在这些条件下,已经成功地生长了在整个组成范围(x = 0--1)内直径为50 mm的Ga1-xInxSb块状多晶。在未掺杂的Ga 1-xInxSb块状晶体中,以下带隙红外透射率(最多25μm)已得到首次研究,发现其受天然缺陷(如基于锑化物的III-V化合物中发现的反位点和空位)的限制。对于富含镓的合金成分(Ga1-xInxSb中的x <0.5),随着净受体浓度的增加和晶体中镓含量的增加,晶体表现出p型导电行为。当x> 0.5(富铟合金组成)时,随着净施主浓度的增加和晶体中铟含量的增加,晶体表现出n型导电性。 (摘要由UMI缩短。)

著录项

  • 作者

    Kim, Hee Jeong.;

  • 作者单位

    Rensselaer Polytechnic Institute.;

  • 授予单位 Rensselaer Polytechnic Institute.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 152 p.
  • 总页数 152
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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