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Synthesis and characterization of mesoporous silica membranes modified by atomic and molecular layer deposition.

机译:原子和分子层沉积改性的介孔二氧化硅膜的合成与表征。

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摘要

Inorganic membranes offer a means for chemical separations in a variety of applications including chemical processing, drug delivery systems, battery separators and fuel cells. There is currently a "pore size gap" in silica membranes between 1-2 nanometers. Synthesizing membranes with a fine control of the pore size and distribution within that gap is a significant challenge. This thesis reports findings on using atomic and molecular layer deposition as new synthesis approaches to controlling pore size and chemical functionality of silica membranes. Mesoporous silica membranes, prepared using surfactant-templates with pore diameters ∼4nm, were modified using atomic layer deposition and molecular layer deposition. Atomic layer deposition was carried out using trimethyl aluminum and water as precursors and molecular layer deposition used trimethyl aluminum and oxalic and o-phthalic acid. These methods involved a separate pulse/purge sequence for each reactant that resulted in surface-limited film growth within the pores.;It was determined that the growth rate of atomic layer deposition of alumina within mesoporous silica membranes was not linear, with a higher growth rate during the first 7 cycles and a lower rate afterwards. Alumina deposition was favored in larger pores within the pore size distribution of the support. The He/N2 selectivity of the membrane was improved by removing defects, although still in the Knudsen range. In preliminary work, the hydrothermal stability of the membrane increased as a result of the addition of alumina into the silica pore network.;In the molecular layer deposition study, higher growth rates were observed when using oxalic acid as a precursor. Both oxalic and o-phthalic acid were able to increase the selectivity of the membrane above the He/N2 Knudsen value. Analysis of the permeance of several light gases suggested that pore size reduction occurred and that the modification was confined to a small layer within the support
机译:无机膜为包括化学处理,药物输送系统,电池隔板和燃料电池在内的各种应用提供了化学分离的方法。目前,二氧化硅膜在1-2纳米之间存在“孔尺寸间隙”。合成膜的孔径和孔内分布的精细控制是一项重大挑战。本文报道了使用原子和分子层沉积作为控制二氧化硅膜孔径和化学功能的新合成方法的发现。使用原子层沉积和分子层沉积对使用孔径约4nm的表面活性剂模板制备的介孔二氧化硅膜进行改性。使用三甲基铝和水作为前体进行原子层沉积,使用三甲基铝和草酸和邻苯二甲酸进行分子层沉积。这些方法涉及每种反应物的独立脉冲/吹扫序列,导致孔内表面受限的膜生长。;确定了介孔二氧化硅膜中氧化铝原子层沉积的生长速率不是线性的,具有较高的增长前7个周期内的费率,然后降低。在载体的孔径分布内的较大孔中有利于氧化铝沉积。膜的He / N2选择性通过去除缺陷得以改善,尽管仍在Knudsen范围内。在初步工作中,由于将氧化铝添加到二氧化硅孔网络中,膜的水热稳定性得到了提高。;在分子层沉积研究中,当使用草酸作为前体时,观察到更高的生长速率。草酸和邻苯二甲酸都能够将膜的选择性提高到He / N2 Knudsen值以上。对几种轻质气体的渗透性的分析表明,孔径减小了,并且改性仅限于载体内的一小层

著录项

  • 作者

    Cassidy, David Emmett.;

  • 作者单位

    The University of Maine.;

  • 授予单位 The University of Maine.;
  • 学科 Engineering Chemical.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 106 p.
  • 总页数 106
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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