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White-light and infrared emission from Silicon Oxycarbide-based materials.

机译:碳氧化硅基材料发出的白光和红外光。

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摘要

The development of a Si-based light source has attracted a high level of attention due to its potential unique advantages. For one, the monolithic integration of photonics on on-chip level along with the microelectronics devices would enhance the data processing rate. Additionally the cost per transmitted/processed information capacity can be significantly reduced.;In this Ph.D. thesis work, amorphous silicon oxycarbide (SiCxOy) is proposed as an active medium for light emission in visible and IR (when doped with Er ions). More specifically, strong room-temperature white luminescence emitted from SiCxOy films grown by thermal chemical vapor deposition (TCVD) is reported. The emission spectra from the films cover a broad spectral range, from blue-violet to near infrared, depending on carbon concentration. It is found that excitation of these materials is primarily taking place through the material absorption while two major excitation bands have been also detected at 3.36 eV and 3.55 eV, associated with Si-C cores and C=O related centers respectively. Furthermore, it was found that the photoluminescence (PL) intensity, in green and red emission bands, was well correlated with Si-O-C bond density, determined from the Fourier transform infrared spectroscopy (FTIR) analysis. Further engineering of the luminescent centers with oxygen treatment and advanced structural analysis with electron paramagnetic resonance confirmed the previous results. (≡Si-)3C * radicals, EX centers and neutral oxygen vacancies were found to exhibit correlation with the matrix luminescence.;The infrared emission of Er ions doped in silicon oxycarbide, around 1540 nm (intra-4f Er3+ transition from 4I13/2 to 4I15/2), was also studied. A broad-band excitation behavior was found, suggesting that the energy transfer is matrix assisted. Additionally, the excitation of Er ions was also found to take place through the 3.36eV excitation band and/or the 0.86 eV relaxation between the 3.36 eV and 2.5 eV green emission bands, associated with the Si-O-C structure. This suggests that the matrix luminescence centers of SiCxOy play the role of sensitizers for Er ions.
机译:硅基光源的发展由于其潜在的独特优势而引起了高度关注。首先,光子学与微电子设备在单片级上的单片集成将提高数据处理速率。另外,可以显着降低每传输/处理的信息容量的成本。论文工作中,提出了非晶态碳氧化硅(SiCxOy)作为可见光和红外光(掺入Er离子时)发光的活性介质。更具体地,报道了通过热化学气相沉积(TCVD)生长的SiCxOy膜发出的强室温白光。薄膜的发射光谱覆盖从蓝紫色到近红外的宽光谱范围,具体取决于碳浓度。发现这些材料的激发主要是通过材料吸收发生的,同时在3.36 eV和3.55 eV处还检测到两个主要的激发带,分别与Si-C核和C = O相关的中心相关。此外,还发现,通过傅立叶变换红外光谱(FTIR)分析确定,绿色和红色发射带中的光致发光(PL)强度与Si-O-C键密度紧密相关。通过氧处理对发光中心进行进一步的工程设计以及利用电子顺磁共振进行的先进结构分析证实了先前的结果。 (≡Si-)3C *自由基,EX中心和中性氧空位与基质发光相关。;掺入碳氧化硅中的Er离子的红外发射约1540 nm(从4I13 / 2到4f内Er3 +跃迁)至4I15 / 2),也进行了研究。发现宽带激发行为,表明能量转移是矩阵辅助的。另外,还发现Er离子的激发通过3.36eV​​激发带和/或在3.36eV​​和2.5eV绿色发射带之间的与Si-O-C结构相关的0.86eV弛豫进行。这表明SiCxOy的基质发光中心起着Er离子敏化剂的作用。

著录项

  • 作者

    Nikas, Vasileios.;

  • 作者单位

    State University of New York at Albany.;

  • 授予单位 State University of New York at Albany.;
  • 学科 Nanoscience.;Nanotechnology.;Engineering Materials Science.;Physics General.
  • 学位 Ph.D.
  • 年度 2013
  • 页码 205 p.
  • 总页数 205
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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