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Studies on field effect transistors with conjugated polymer and high permittivity gate dielectrics using pulsed plasma polymerization.

机译:利用脉冲等离子体聚合技术研究具有共轭聚合物和高介电常数栅极电介质的场效应晶体管。

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摘要

The aim of this Ph.D. project is to explore the operating mechanism of polymer field effect transistors (PFETs) to improve their performance. Polymer semiconductors are composed of pi-conjugated polymers and have the advantage of easy processing. Their solution processibility at room temperature makes them an attractive candidate for light-weight, large-area, flexible electronics. However, the performance of PFETs is currently limited by low carrier mobility and high driving voltages. This dissertation presents thin film insulators as new gate dielectric materials to relax the requirement for driving voltages and illustrates some unique features of field dependent mobility in PFETs. Light responsive PFETs based on new polymer semiconductors are also demonstrated as a potential application of PFETs.; Pulsed plasma deposited polymer insulating films were investigated for their potential application as the gate dielectric in PFETs. The work on pulsed plasma polymerized (PPP) thin film insulators put emphasis on improving the dielectric constant of the thin polymer films. The driving voltage of a PFET can be reduced by using gate insulators with a high dielectric constants. Early work on PPP allylamine films indicated that the chamber temperature during pulsed plasma polymerization has an effect on the dielectric constant. PPP allylamine films were employed as the insulating layers and tested as metal-insulator-semiconductor (MIS) capacitors. The insulating polymer films were deposited at plasma reactor temperatures of 25°C and 100°C. Multiple frequency capacitance-voltage (C-V) measurements indicated that an in-situ heat treatment during film deposition increased the insulator dielectric constant. The dielectric constant, calculated from the C-V data, rose from 3.03 for samples with no heat treatment to 3.55 for samples with an in-situ heat treatment. For both sample sets, the I-V data demonstrates a low leakage current value (0.65 pA/mm2) up to 100V.; Later work on PPP insulators took advantage of engineering ability of the dielectric constant of the polymer film by the judicious selection of a monomer possessing a high polarizability. Polymerized dichlorotetramethyldisiloxane (DCTMDS) films deposited by radio frequency pulsed plasma polymerization (PPP) demonstrated very high dielectric constants for an organic-based system, in the range of 7 to 10. (Abstract shortened by UMI.)
机译:本博士的目的该项目旨在探索聚合物场效应晶体管(PFET)的工作机制,以改善其性能。聚合物半导体由π共轭聚合物组成,具有易于加工的优点。它们在室温下的溶液可加工性使其成为重量轻,大面积,柔性电子产品的有吸引力的候选人。但是,PFET的性能目前受到低载流子迁移率和高驱动电压的限制。本文提出了薄膜绝缘体作为一种新型的栅极介电材料,以放松对驱动电压的要求,并说明了PFET中与场有关的迁移率的一些独特特征。基于新型聚合物半导体的光响应型PFET也被证明是PFET的潜在应用。研究了脉冲等离子体沉积的聚合物绝缘膜在PFET中作为栅极电介质的潜在应用。脉冲等离子体聚合(PPP)薄膜绝缘子的工作重点在于提高聚合物薄膜的介电常数。通过使用具有高介电常数的栅极绝缘体可以降低PFET的驱动电压。 PPP烯丙胺薄膜的早期工作表明,脉冲等离子体聚合过程中的反应室温度会影响介电常数。 PPP烯丙胺膜用作绝缘层,并已作为金属-绝缘体-半导体(MIS)电容器进行了测试。在25℃和100℃的等离子体反应器温度下沉积绝缘聚合物膜。多频电容-电压(C-V)测量表明,膜沉积过程中的原位热处理提高了绝缘体的介电常数。根据C-V数据计算出的介电常数从未经热处理的样品的3.03上升到经过原位热处理的样品的3.55。对于两个样品组,I-V数据均显示了高达100V的低漏电流值(<0.65 pA / mm2)。后来在PPP绝缘子上的工作通过明智地选择具有高极化率的单体来利用聚合物膜介电常数的工程设计能力。通过射频脉冲等离子体聚合(PPP)沉积的聚合二氯四甲基二硅氧烷(DCTMDS)膜对基于有机物的系统显示出非常高的介电常数,范围为7到10。(由UMI缩短)。

著录项

  • 作者

    Xu, Yifan.;

  • 作者单位

    The Ohio State University.;

  • 授予单位 The Ohio State University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 207 p.
  • 总页数 207
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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