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Development of fluorinated monomers and polymers for advanced photolithographic applications.

机译:用于高级光刻应用的氟化单体和聚合物的开发。

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摘要

The incorporation of fluorine into photoresist materials imparts a variety of highly desirable properties for deep ultraviolet lithography at 193 nm and 157 nm. Chief amongst these benefits are the high optical transparency of partially fluorinated materials and the high acidity of fluorocarbinols. Yet, significant challenges remain to incorporate sufficient fluorine necessary for high transparency into functionalized norbornene monomers without adversely affecting transition metal polymerization processes.; Chapter 2 details the synthesis and characterization of a series of partially fluorinated tricyclo[4.2.1.02,5]non-7-ene (TCN) monomers. The fused cyclobutane ring serves as an additional scaffold onto which additional fluorinated groups can be incorporated in order to increase transparency at 157 nm without adversely affecting the polymerization behavior of the monomer. The synthesis and imaging of TCN-based photoresist polymers is explored in Chapter 3.; Chapter 4 introduces a series of 3-oxa-tricyclonon-7-ene and 4-oxa-tricyclonon-8-ene monomers synthesized from quadricyclane and fluorinated ketones. In chapter 5, addition and ring-opening metathesis polymers of fluorinated oxatricyclononenes are shown to offer transparencies similar to a hexafluorocarbinol-functionalized norbornene addition polymer, revealing the effect of the alicyclic backbone structure on transparency at 157 nm. 4-Oxatricyclononenes are valuable comonomers for the elevation of glass transition temperatures in ROMP polymers, while low molecular weight ROMP copolymers of 3-oxatricyclonene are being evaluated as crosslinking agents in negative tone resist formulations.; Chapter 6 details the use of cross-metathesis and ring-opening cross-metathesis in the synthesis of multifunctional monomers and oligomers for 193 nm immersion and 157 nm lithography. Cross-metathesis with unsaturated hexafluorocarbinols is a facile method to generate functionalized olefins without using hexafluoroacetone. These developments culminate in the synthesis of difunctional norbornenes containing both ester and hexafluorocarbinol functionalities which display dramatically increased transparency at 157 nm and will potentially afford unique dissolution behavior.; Finally, chapter 7 explores the synthesis of trisubstituted olefins via ruthenium-catalyzed cross-metathesis. 2-Methyl-2-butene is a convenient isobutylene surrogate in the formation of prenyl groups via cross-metathesis.{09}Understanding of the reactivity of second-generation metathesis catalysts with 1,1-disubstituted and trisubstituted olefins has prompted the exploration of ring-opening cross-metathesis of low strain cyclic olefins and three component cross-metathesis reactions with high product selectivity.
机译:将氟掺入光致抗蚀剂材料中为深紫外光刻在193 nm和157 nm下赋予了各种非常理想的特性。这些优点中的主要优点是部分氟化的材料的高光学透明度和氟代甲醇的高酸度。然而,将高透明性所需的足够的氟引入官能化的降冰片烯单体中而又不对过渡金属聚合过程产生不利影响方面,仍然存在重大挑战。第2章详细介绍了一系列部分氟化的三环[4.2.1.02,5] non-7-ene(TCN)单体的合成和表征。稠合的环丁烷环用作附加的支架,可以在其上引入附加的氟化基团,以增加157 nm的透明度,而不会不利地影响单体的聚合行为。第三章探讨了基于TCN的光刻胶聚合物的合成和成像。第4章介绍了由四环烷和氟化酮合成的一系列3-氧杂三环酮-7-烯和4-氧杂三环酮-8-烯单体。在第5章中,氟化氧三环壬烯的加成和开环复分解聚合物显示出与六氟甲醇官能化的降冰片烯加成聚合物相似的透明性,揭示了脂环式骨架结构对157 nm透明性的影响。 4-氧三环壬烯是提高ROMP聚合物中玻璃化转变温度的有价值的共聚单体,而3-氧三环烯的低分子量ROMP共聚物正被评估为负性抗蚀剂配方中的交联剂。第6章详细介绍了交叉复分解和开环交叉复分解在用于193 nm浸没和157 nm光刻的多功能单体和低聚物的合成中的用途。与不饱和六氟甲醇的交叉复分解是一种不使用六氟丙酮即可生成官能化烯烃的简便方法。这些发展最终导致了同时含有酯和六氟甲醇官能团的双官能降冰片烯的合成,该双官能降冰片烯在157 nm处的透明度显着提高,并有可能提供独特的溶解行为。最后,第7章探讨了通过钌催化的交叉复分解反应合成三取代烯烃的方法。 2-甲基-2-丁烯是通过异位复分解形成异戊烯基的一种方便的异丁烯替代物。{09}对第二代复分解催化剂与1,1-二取代和三取代烯烃的反应性的了解促使人们探索低应变环烯烃的开环交叉复分解和具有高产物选择性的三组分交叉复分解反应。

著录项

  • 作者

    Sanders, Daniel P.;

  • 作者单位

    California Institute of Technology.;

  • 授予单位 California Institute of Technology.;
  • 学科 Chemistry Polymer.; Chemistry Organic.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 270 p.
  • 总页数 270
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 高分子化学(高聚物) ; 有机化学 ;
  • 关键词

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