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Defining the passive state of Alloy 22 using electrochemical impedance spectroscopy and deterministic modeling.

机译:使用电化学阻抗谱和确定性模型定义合金22的钝态。

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摘要

Storage of High Level Nuclear Waste (HLNW) requires prediction of corrosion behavior with unprecedented accuracy over thousands of years. To support this need, high-accuracy electrochemical data are required. A laboratory with special features to support long-term electrochemical tests has been designed, built, and proven. High-accuracy electrochemical impedance spectroscopy (EIS) data and passive current densities have been measured for Alloy 22 in deaerated pH 6, 4 M NaCl and pH 3, 0.1 M Cl- electrolytes at temperatures of 30°, 60°, 75°, and 90°C. Accuracy of the EIS data has been verified by checking for hysteresis of back to back scans and in data collected hundreds of hours apart, and through application of the Kramers-Kronig transforms. The data are interpreted in terms of the Point Defect Model (PDM) of growth and breakdown of passive films. Mott-Schottky analysis is applied to evaluate the semiconductor properties of the passive film. At low potential the passive film is found to be an n-type semiconductor. The film transitions to a p-type semiconductor as potential is increased towards the transpassive potential. Impedance data collected into the transpassive range show a large drop in capacitance at low frequency. This can be interpreted as thinning of the film and weakening of the lattice structure. The observed behavior can be explained in terms of the PDM reaction mechanism as cation vacancy generation by oxidative ejection of cations at the film/solution interface. Comparison of low frequency impedance data, particularly phase shift, between 4 M NaCl and 0.1 M Cl- solutions indicates that passive film properties are relatively insensitive to chloride concentration. Mott-Schottky analysis indicates carrier density is relatively insensitive to chloride concentration. The equations derived from the PDM have been programmed into a commercial curve fitting software package, which optimizes estimated parameters on the PDM to derive a "best fit" parameter set using nonlinear curve fitting. It may also be used to calculate impedance from a given set of model parameters derived from another method such as phase space analysis. A "best guess" parameter set from phase space analysis was found to provide a good match between calculated and measured impedance, current density, and film thickness. However, the curve fitting method is unconstrained and was found to generate multiple solutions for a single impedance spectrum. When multiple parameter sets that provide good matches between calculated and measured impedance data were used to calculate barrier layer thickness and passive current density, many solutions resulted in unrealistic values. This demonstrates that the curve fitting method must be constrained by including thickness and current density equations in the model. Though unconstrained, the modeled parameters provide useful insights into the PDM reaction mechanism indicating cation interstitials are the dominant defect.
机译:高级核废料(HLNW)的存储要求以数千年的前所未有的准确性预测腐蚀行为。为了满足该需求,需要高精度的电化学数据。已经设计,建造并验证了具有支持长期电化学测试的特殊功能的实验室。已经在30°,60°,75°C和30°C的脱气pH 6、4 M NaCl和pH 3、0.1 M Cl电解质中测量了合金22的高精度电化学阻抗谱(EIS)数据和无源电流密度。 90℃。通过检查背对背扫描的滞后性以及相隔数百小时收集的数据,并通过应用Kramers-Kronig变换,可以验证EIS数据的准确性。数据根据无源薄膜的生长和击穿的点缺陷模型(PDM)进行解释。 Mott-Schottky分析应用于评估钝化膜的半导体特性。在低电势下,发现无源膜是n型半导体。随着电势朝着透射型电势增加,薄膜转变为p型半导体。收集到跨导范围内的阻抗数据显示出低频电容的大幅度下降。这可以解释为薄膜变薄和晶格结构变弱。可以根据PDM反应机理将观察到的行为解释为通过在膜/溶液界面处阳离子的氧化喷射而产生的阳离子空位。比较4 M NaCl和0.1 M Cl-溶液之间的低频阻抗数据,尤其是相移,表明无源膜性能对氯化物浓度相对不敏感。 Mott-Schottky分析表明,载流子密度对氯化物浓度相对不敏感。从PDM导出的方程式已被编程到商业曲线拟合软件包中,该软件包可优化PDM上的估计参数,以使用非线性曲线拟合得出“最佳拟合”参数集。它也可用于根据一组给定的模型参数(来自相空间分析等其他方法)来计算阻抗。发现相空间分析中的“最佳猜测”参数集可在计算出的和测量到的阻抗,电流密度和膜厚之间提供良好的匹配。但是,曲线拟合方法不受限制,并且发现它可以为单个阻抗谱生成​​多个解。当使用在计算的阻抗数据和测量的阻抗数据之间提供良好匹配的多个参数集来计算势垒层厚度和无源电流密度时,许多解决方案都会产生不切实际的值。这表明必须通过在模型中包括厚度和电流密度方程来约束曲线拟合方法。尽管不受约束,但是建模参数为PDM反应机理提供了有用的见解,表明阳离子间隙是主要缺陷。

著录项

  • 作者

    McMillion, L. Glen.;

  • 作者单位

    University of Nevada, Reno.;

  • 授予单位 University of Nevada, Reno.;
  • 学科 Engineering Metallurgy.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 224 p.
  • 总页数 224
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 冶金工业;
  • 关键词

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