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Advanced Study of Pulsed Laser Micro Polishing.

机译:脉冲激光微抛光的高级研究。

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摘要

A fundamental study of pulsed laser micro polishing (PLµP) was conducted as a method for reducing surface roughness of micro/meso-scale metallic parts. Although PLµP was shown to be an effective process at these scales, the knowledge of the process physics lacked thoroughness. The goal of this work, therefore was to improve upon the existing knowledge of PLµP, with focus on developing physics based models, understanding the effects of various process parameters and developing strategies for selection of process parameters and laser scan trajectories.;In PLµP, a small area on a surface is irradiated with laser pulses to melt roughness features. The molten features are smoothed out by surface tension and viscous forces. Two polishing regimes for PLµP, namely thermocapillary regime and capillary regime, were defined based on whether the temperature gradient of surface tension driven thermocapillary flows are dominant or negligible. Dominant thermocapillary flows, in the thermocapillary regime, result in significant smoothening of both low and high spatial frequency features, but introduce residual low-amplitude high spatial frequency features. In the capillary regime, thermocapillary flows are negligible and the molten features oscillate as stationary capillary waves that damp out due to the viscosity of the molten metal. The capillary regime is only effective at smoothening higher spatial frequency features. A physics based surface finish prediction model was developed and validated for the capillary regime.;The fundamental understanding of the two polishing regimes lead to the development of a two-pass multi-regime PLµP method that takes advantage of both the polishing regimes. In this method, the first pass, in the thermocapillary regime, results in significant reduction of the surface roughness. The second pass, in the capillary regime, removes the residual process features introduced in the first pass. Finally, an artificial potential fields based method was proposed to generate laser scan trajectories for PLµP that can overcome the limitations of a zigzag trajectory. In this method, artificial attractive fields are assigned based on surface condition and repulsive fields assigned to regions where polishing is not desired. The generated trajectories are irregular, smooth and adapt to the changing surface condition of surface being polished.
机译:进行了脉冲激光微抛光(PLµP)的基础研究,作为减少微/中尺度金属零件表面粗糙度的方法。尽管PLµP被证明是在这些规模上都是有效的过程,但是对过程物理学的了解还不够全面。因此,这项工作的目的是要改进PLµP的现有知识,重点在于开发基于物理学的模型,了解各种工艺参数的影响以及开发工艺参数和激光扫描轨迹的选择策略。用激光脉冲辐照表面上的小区域以熔化粗糙度特征。熔融的特征通过表面张力和粘性力得以平滑。根据表面张力驱动的热毛细流的温度梯度是主要的还是可忽略的,定义了PLµP的两种抛光方法,即热毛细管法和毛细管法。在热毛细管状态下,占主导地位的热毛细管流导致低空间频率特征和高空间频率特征的显着平滑,但是引入了残留的低振幅高空间频率特征。在毛细状态下,热毛细流可以忽略不计,熔融特征随着固定的毛细波而振荡,该毛细波由于熔融金属的粘度而衰减。毛细血管状态仅对平滑较高的空间频率特征有效。开发了基于物理的表面光洁度预测模型,并针对毛细管状态进行了验证。;对两种抛光方式的基本了解导致开发了一种通过两种抛光方式的两次通过的多区域PLµP方法。在这种方法中,在热毛细管状态下的第一次通过可显着降低表面粗糙度。在毛细管状态下的第二遍去除了在第一遍中引入的残留工艺特征。最后,提出了一种基于人工势场的方法来产生PLµP的激光扫描轨迹,该方法可以克服之字形轨迹的局限性。在这种方法中,基于表面条件分配了人工吸引力场,而将排斥场分配给了不需要抛光的区域。产生的轨迹是不规则的,平滑的,并适应被抛光表面的变化表面状态。

著录项

  • 作者

    Vadali, Venkata Madhukanth.;

  • 作者单位

    The University of Wisconsin - Madison.;

  • 授予单位 The University of Wisconsin - Madison.;
  • 学科 Engineering Mechanical.
  • 学位 Ph.D.
  • 年度 2013
  • 页码 126 p.
  • 总页数 126
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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