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Characteristics of graphite films on silicon- and carbon -terminated faces of silicon carbide.

机译:碳化硅的硅和碳封端的表面上的石墨膜的特性。

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摘要

Ultrathin graphite films grown on silicon carbide (SiC) form a promising platform for ballistic-carrier devices based on nano-patterned epitaxial graphene [11]. Graphite films with thickness from 1--30 atomic layers are grown on the Si-terminated (0001) face and C-terminated (0001¯) face of 6H-SiC and 4H-SiC via thermal desorption of silicon in an ultrahigh vacuum (UHV) chamber or in a high-vacuum RF furnace. The growth of graphite films is investigated with low energy electron diffraction (LEED), Auger electron spectroscopy (AES), and scanning tunneling microscopy (STM). Graphite LEED patterns and atom-resolved STM images on graphite films prove that epitaxial growth is achieved on both faces of the SiC substrate. The thickness of graphite films is estimated with two methods, modeling the Si:C Auger peak to peak intensities with simplified assumptions and curve-fitting of synchrotron X-ray diffraction peaks.;Through LEED and STM investigations of monolayer graphite grown on the Si-face of 6H-SiC(0001), we show the existence of a SiC 63x63 R30° reconstructed layer between graphite films and the SiC substrate. The graphite films prepared on the Si-face have less than 0.2A vertical amplitude corrugation following a SiC 6x6 periodicity. We prove that this assumption is related to the SiC 63x63 R30° reconstruction layer. We also prove that the kinematic scattering from the SiC 63x63 R30° interfacial structure gives a good interpretation of the complicated 63x63 R30° LEED diffraction patterns, which traditionally are regarded as the result of double-scattering from the graphite film and SiC substrate. The graphitized surfaces show structurally coherent 50nm2 domains with surface height difference between adjacent domains in the same terrace varying from 0.5A to 3.0A. The minimum corresponds to the Si-C vertical separation within one SiC bilayer and the maximum to the graphite interlayer spacing. Further scanning tunneling spectroscopy (STS) measurements and low temperature STM show that the graphite films remain continuous over the steps between domains.;Ultrathin graphite films grown on the C-face of 6H-SiC(0001¯) in the UHV chamber or in the RF furnace are also investigated. Some areas of the surface prepared in RF furnace are covered by nanocaps or nanotubes, and the remaining areas are flat graphite films. The huge nanotube-like bumps often form common boundaries of the domains. The graphitized C-face surface generally has larger size domains and terraces than Si-face according to AFM and X-ray experiments. LEED patterns from the thinnest C-face films show epitaxial growth on the SiC substrate, however split diffraction arcs in the LEED pattern from thicker films indicate azimuthal disorder.
机译:生长在碳化硅(SiC)上的超薄石墨膜为基于纳米图案外延石墨烯的弹道载体器件提供了一个有前途的平台[11]。通过在超高真空(UHV)中对硅进行热脱附,在6H-SiC和4H-SiC的Si端(0001)面和C端(0001′)面上生长厚度为1--30原子层的石墨膜)室或高真空RF炉中。用低能电子衍射(LEED),俄歇电子能谱(AES)和扫描隧道显微镜(STM)研究了石墨膜的生长。石墨膜上的石墨LEED图案和原子分解的STM图像证明,在SiC衬底的两个面上均实现了外延生长。用两种方法估算石墨膜的厚度,用简化的假设对Si:C Auger峰到峰强度进行建模,并对同步加速器X射线衍射峰进行曲线拟合。通过LEED和STM研究,在Si-C上生长的单层石墨面对6H-SiC(0001),我们显示了在石墨膜和SiC衬底之间存在SiC 63x63 R30°重构层的情况。按照SiC 6x6周期性,在Si面上制备的石墨膜的垂直振幅波纹小于0.2A。我们证明该假设与SiC 63x63 R30°重建层有关。我们还证明,来自SiC 63x63 R30°界面结构的运动学散射可以很好地解释复杂的63x63 R30°LEED衍射图样,传统上将其视为从石墨膜和SiC衬底双重散射的结果。石墨化的表面显示出结构上相干的50nm2域,同一阶地中相邻域之间的表面高度差在0.5A至3.0A之间变化。最小值对应于一个SiC双层内的Si-C垂直间距,最大值对应于石墨层间间距。进一步的扫描隧道光谱(STS)测量和低温STM显示,在区域之间的台阶上,石墨膜保持连续。;在超高压腔室或内部的6H-SiC(0001)C面上生长的超薄石墨膜。还对射频炉进行了研究。在RF炉中制备的表面的某些区域被纳米帽或纳米管覆盖,其余区域为平坦的石墨膜。巨大的类似纳米管的凸起通常形成畴的共同边界。根据AFM和X射线实验,石墨化的C面表面通常具有比Si面更大的尺寸域和平台。来自最薄C面膜的LEED图案在SiC衬底上显示出外延生长,但是来自较厚膜的LEED图案中的分裂衍射弧表明方位角混乱。

著录项

  • 作者

    Li, Tianbo.;

  • 作者单位

    Georgia Institute of Technology.;

  • 授予单位 Georgia Institute of Technology.;
  • 学科 Condensed matter physics.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 113 p.
  • 总页数 113
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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