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Low pressure chemical vapor deposition of amorphous-silicon:hydrogen from disilane.

机译：从乙硅烷中低压化学气相沉积非晶硅：氢。

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作者
Petersburg, Cole.;
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作者单位

Iowa State University.;

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授予单位 Iowa State University.;
学科 Engineering Electronics and Electrical.; Engineering Materials Science.
学位 M.S.
年度 2007
页码 77 p.
总页数 77
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;工程材料学;
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Low pressure chemical vapor deposition of amorphous-silicon:hydrogen from disilane.

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