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Growth and characterization of nanocrystalline diamond films for microelectronics and microelectromechanical systems.

机译:用于微电子学和微机电系统的纳米晶金刚石薄膜的生长和表征。

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摘要

Diamond is widely known for its extraordinary properties, such as high thermal conductivity, energy bandgap and high material hardness and durability making it a very attractive material for microelectronic and mechanical applications. Synthetic diamonds produced by chemical vapor deposition (CVD) methods retain most of the properties of natural diamond. Within this class of material, nanocrystalline diamond (NCD) is being developed for microelectronic and microelectromechanical systems (MEMS) applications. During this research, intrinsic and doped NCD films were grown by the microwave plasma enhanced chemical vapor deposition (MPECVD) method using CH4/Ar/H2 gas mixture and CH4/Ar/N2 gas chemistries respectively.;The first part of research focused on the growth and characterization of NCD films while the second part on the application of NCD as a structural material in MEMS device fabrication. The growth processes were optimized by evaluating the structural, mechanical and electrical properties. The nature of chemical bonding, namely the ratio of sp2:sp 3 carbon content was estimated by Raman spectroscopy and near edge x-ray absorption fine structure (NEXAFS) techniques. The micro-structural properties were studied by x-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). The mechanical properties of the pure NCD films were evaluated by nano-indentation. The electrical properties of the conductive films were studied by forming ohmic as well as schottky contacts.;In second part of this study, both free-standing and membrane capped field emitter devices were fabricated by a silicon mold technique using nitrogen incorporated (i.e., doped) NCD films. The capped field emission devices act as a prototype vacuum microelectronic sensor. The field emission tests of both devices were conducted using a diode electrical device model. The turn-on field and the emission current of free-standing emitter devices was found to be approximately 0.8 V/mum and 20 muA, respectively, while the turn-on fields of capped devices increased by an order of magnitude. The emission current in the field emission sensor changed from 1 muA to 25 muA as the membrane was deflected from 280 mum to 50 mum from the emission tip, respectively.
机译:金刚石以其非凡的性能而闻名,例如高导热率,能带隙以及高材料硬度和耐用性,使其成为微电子和机械应用中非常有吸引力的材料。通过化学气相沉积(CVD)方法生产的合成钻石保留了天然钻石的大部分特性。在此类材料中,正在为微电子和微机电系统(MEMS)应用开发纳米晶金刚石(NCD)。在这项研究中,本征和掺杂的NCD薄膜分别采用CH4 / Ar / H2气体混合物和CH4 / Ar / N2气体化学混合物通过微波等离子体增强化学气相沉积(MPECVD)方法生长。 NCD膜的生长和表征,而第二部分是将NCD用作MEMS器件制造中的结构材料。通过评估结构,机械和电气性能优化了生长过程。化学键的性质,即sp2:sp 3碳含量的比率是通过拉曼光谱法和近边缘x射线吸收精细结构(NEXAFS)技术估算的。通过X射线衍射(XRD),原子力显微镜(AFM),扫描电子显微镜(SEM)和透射电子显微镜(TEM)研究了微观结构性质。通过纳米压痕评估纯NCD膜的机械性能。通过形成欧姆接触和肖特基接触来研究导电膜的电性能。在本研究的第二部分中,独立式和膜覆盖场致发射器器件都是通过硅模技术使用掺入氮(即掺杂)制成的。 )NCD电影。带帽的场发射器件充当原型真空微电子传感器。两种器件的场发射测试都是使用二极管电子器件模型进行的。发现独立式发射器器件的导通场和发射电流分别约为0.8 V / mum和20μA,而带帽器件的导通场增加了一个数量级。当膜分别从发射尖端偏转280 mum至50 mm时,场发射传感器中的发射电流从1μA变为25μA。

著录项

  • 作者

    Jeedigunta, Sathyaharish.;

  • 作者单位

    University of South Florida.;

  • 授予单位 University of South Florida.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 166 p.
  • 总页数 166
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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