Photopolymerization by the Direct Laser Writing

摘要

We report novel use of photopolymerization for direct laser writing of submicrometer-sized structures in photo-curable resins. This technique is based on the solidification of liquid resins upon their exposure to the intense light irradiation. Exposing the liquid resin to intentionally formed complex light patterns allows to transform these patterns into shapes of the solidified objects, which may have small, submicrometer-sized features. Implementations of this technique and its applications for the fabrication of various polymeric microobjects and photonic crystal structures are described.