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Effect of growth parameters on stress in HVPE GaN films

机译:生长参数对HVPE GaN薄膜应力的影响

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摘要

The effect of growth parameters on stress in thick GaN films grown on sapphire by HVPE method was investigated. We have found two modes of growth with different growth stress. Films grown in one mode have rough surfaces and low stress. The second mode leads to smooth surfaces but the films contain many cracks due to high growth stress. A combination of these modes allows growth of films without cracks and with smooth surfaces.
机译:研究了生长参数对通过HVPE方法在蓝宝石上生长的厚GaN膜中应力的影响。我们发现了两种具有不同增长压力的增长模式。以一种模式生长的薄膜表面粗糙且应力低。第二种模式导致表面光滑,但是由于高的生长应力,薄膜包含许多裂纹。这些模式的组合可以使薄膜生长而无裂纹且表面光滑。

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  • 会议地点 Montreal(CA);Montreal(CA)
  • 作者单位

    St.-Petersburg State Polytechnical University, 29, Polyteknicheskaya str., 194021, St.-Petersburg, Russia;

    Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;

    St.-Petersburg State Polytechnical University, 29, Polyteknicheskaya str., 194021, St.-Petersburg, Russia;

    Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;

    Physics Institute of St.Petesburg State University, 1, Ulianovskaya str., 198504, St.-Petersburg, Russia;

    Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;

    Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;

    Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;

    Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;

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