St.-Petersburg State Polytechnical University, 29, Polyteknicheskaya str., 194021, St.-Petersburg, Russia;
Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;
St.-Petersburg State Polytechnical University, 29, Polyteknicheskaya str., 194021, St.-Petersburg, Russia;
Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;
Physics Institute of St.Petesburg State University, 1, Ulianovskaya str., 198504, St.-Petersburg, Russia;
Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;
Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;
Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;
Ioffe Physical Technical Institute, 26, Polyteknicheskaya str., 194021, St-Petersburg, Russia;
机译:通过HVPE生长比较在MOCVD-GaN / Al_2O_3和MOCVD-GaN / SiC样品上生长的GaN薄膜的应变
机译:使用HVPE生长的GaN体靶,通过激光分子束外延在蓝宝石(0001)上高度c轴取向生长GaN膜
机译:HVPE在蓝宝石上生长的厚GaN膜中的柱状结构和应力松弛
机译:生长参数对HVPE GaN薄膜应激的影响
机译:通过异质外延GaN薄膜中的缓冲层控制应力和缺陷
机译:HVPE生长的GaN晶体中的应力对MOCVD-GaN / 6H-SiC衬底的影响
机译:使用HVpE生长的GaN体靶通过激光分子束外延在钴蓝(0001)上高度c轴取向生长GaN膜