Faculty of Mechanical Engineering and Automation,Liao-ning University of technology, jinzhou121001,China;
PetroChina Northeast Refining Chemicals Engineering Company Limited JinZhou Design Institute,Jinzhou, 121001 China;
Faculty of Mechanical Engineering and Automation,Liao-ning University of technology, jinzhou 121001,China;
Photoluminescence,A12O3,Thin films,Tb; magnetron sputtering;
机译:反应射频磁控溅射结合生长后退火在Al2O3(0001)上生长的铁磁Zn1-xCoxO薄膜的表征
机译:磁控溅射制备Zn_3N_2:Tb薄膜的绿色光致发光
机译:中频反应磁控溅射制备氧化铝薄膜的目标电压迟滞行为及控制点。
机译:来自Al2O3的绿色光致发光:通过中频反应磁控溅射的TB膜
机译:在高温“智能”摩擦应用中,在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
机译:通过射频磁控溅射生长的富硅Al2O3膜:结构和光致发光特性与退火处理的关系
机译:射频磁控共溅射制备al2O3 / al族al2O3 / siO2叠层薄膜的电荷俘获特性