Investigating EUV Radiochemistry with Condensed Phase Photoemission

摘要

In EUV, photoelectrons and secondary electrons play indispensable roles in the chemistry of photoresist. Anaccurate understanding of electron related processes provides foundation for targeted engineering of resists andother EUV materials. As chemistry is initiated by secondary electrons, acquiring the electron energy distributioninside an actual photoresists is important for improving the effciency of chemical activation. We demonstratethat condensed phase photoemission spectroscopy can be used as a tool for interrogating electrons in resistand electrons owing from underlayers to resists. The electron energy distribution, albeit diu000berent from thatmeasured with condensed phase photoemission spectroscopy, can be recovered computationally. The computa-tional approach involves Monte Carlo simulations using the energy resolved scattering mean free path and thephotoemission energy spectra as inputs.