Theoretical and Experimental Investigation of Soft X-Rays Emitted from TIN Plasmas for Lithographic Application

摘要

Extreme ultraviolet lithography (EUVL) requires an emission of soft x-rays around a wavelength region of 13.5 nm. EHYBRID simulation was made under the laser operation at 1064 nm with a pulse duration of 6 ns. Intensity was changed between 1 × 10~(12) W/cm~2 and 5 × 10~(12) W/cm~2. Soft X-rays emitted from Sn XII and Sn XIII ions were simulated by using the EHYBRID code. Ion fractions of the tin ions and the line intensities for different electron temperatures were calculated by using the collisional radiative code NeF.