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CHEMISTRY CONSISTENCY ANALYSIS OF TUNGSTEN-DOPED DIAMOND-LIKE CARBON (DLC) COATINGS

机译:掺钨类金刚石(DLC)涂层的化学一致性分析

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Tungsten-doped diamond-like carbon (DLC) coatings have been magnetron sputtered onto 52100 steel with chromium and chromium/tungsten carbide dual interlayers using a Hauzer Techno Coating HTC 1200 4 UBM unbalanced magnetron deposition system. Internal fixturing to the deposition chamber rotates parts to be coated with a two degree of freedom system. By design, at certain intervals during the deposition, the acetylene flow is linearly altered to change film characteristics throughout the film. AES sputter depth profiling analysis shows that the fixture rotational system, designed to uniformly coat parts, causes localized chemistry variations in the coating. For a given location, the AES depth profile also clearly documents the intervals when acetylene flow was constant and when the flow was ramped.
机译:使用Hauzer Techno Coating HTC 1200 4 UBM非平衡磁控管沉积系统,将掺钨的类金刚石碳(DLC)涂层磁控溅射到具有铬和铬/碳化钨双中间层的52100钢上。对沉积室的内部固定使要涂覆两自由度系统的零件旋转。通过设计,在沉积过程中以一定的间隔,乙炔流量会线性变化,从而改变整个薄膜的薄膜特性。 AES溅射深度剖析分析表明,旨在均匀涂覆零件的夹具旋转系统会导致涂层中的局部化学变化。对于给定的位置,AES深度曲线还清楚地记录了乙炔流量恒定和流量增加时的时间间隔。

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