Diagnostics in Reactive Plasmas with Optical Emission Spectroscopy, Probe Measurement and Energy-Mass Spectrometry

摘要

In the field of thin film deposition, low density plasmas have gained more and more importance. Where as the frequency of electrical power input ranges from directed current up to several gigahertz the corresponding low pressure plasmas are operated in various types of plasma reactors, such as high vacuum and wall stabilized dc-arcs, capacitive (CCP) and inductive coupled (ICP) radio frequency (rf) reactors (13.56 and 27.12MHz), or microwave (2.45GHz) and electron cyclotron resonance sources (ECR). In many respects, these low density plasmas are comparable, for example in the complete decoupling of heavy particle and electron temperature or in the generation of charged particles which is mainly due to electron impact ionisation. Generally spoken, these plasmas are far from thermal equilibrium, a situation which complicates the diagnostics of the plasma parameters and the analysis of the physical and chemical behavior.