Lab. Optoelectron. et Physico-chimie des Mater., Univ. Ibn Tofail, Kenitra, Morocco;
II-VI semiconductors; X-ray diffraction; aluminium; doping profiles; nonlinear optical susceptibility; pyrolysis; scanning electron microscopy; semiconductor doping; semiconductor growth; semiconductor thin films; spray coating techniques; wide band gap semiconductors; zinc compounds; Al concentration; SiOsub2/sub; ZnO; ZnO:Al; aluminum doped zinc oxide thin films; crystallinity; heated glass substrates; reactive chemical pulverization; spray pyrolysis; temperature 450 degC; third harmonic generation; third order n;
机译:Cu:ZnO / TiO
机译:铝掺杂对喷雾热解法制备ZnO薄膜的结构,光学,电学和阴极发光性能的影响
机译:喷雾热解技术制备的Sn-N共掺杂p型ZnO薄膜的结构,光电性能
机译:ZnO的三阶非线性光学性能:通过喷雾热解制备的Al薄膜
机译:溶胶-凝胶法制备过渡金属氧化物薄膜的三阶非线性光学性质的研究
机译:超声喷涂热解氟掺杂氧化锡薄膜的纳米力学和材料性能:F掺杂的影响
机译:喷雾热解法制备ZnO:al薄膜的三阶非线性光学性质