COATING CHARACTERIZATION IN CrN DEPOSITED BY MAGNETRON SPUTTERING METHOD ON AISI 316 STEEL

摘要

Chromium Nitride (CrN) thin films were deposited on steel AISI 316 substrates with reactive magnetron sputtering method. CrN films were produced under two different conditions. In the first one, the substrate was heated by a d.c. source. At the second coating was applied a negative substrate bias voltage. X ray diffraction, quantitative energy dispersive and scanning electron microscope, were employed to characterize their phases, chemical composition and microstructure. Additionally microhardness was evaluated using a microhardness tester. The results show that the phase formation of CrN thin films in the first case (with temperature) is better. Both coatings presented homogeneous surface. Their compositions shows differences though that gases flow are same. In attention to their hardness, presents an increment if it's compared with hardness substrate.