首页> 外文会议>Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XIV; Progress in Biomedical Optics and Imaging; vol.8 no.20; Proceedings of SPIE-The International Society for Optical Engineering; vol.6443 >Absolute and relative quantification and calibration for sectioning fluorescence microscopy using standardized uniform fluorescent layers and SIPchart based correction procedures
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Absolute and relative quantification and calibration for sectioning fluorescence microscopy using standardized uniform fluorescent layers and SIPchart based correction procedures

机译:使用标准化均匀荧光层和基于SIPchart的校正程序对切片荧光显微镜进行绝对和相对定量和校准

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摘要

The total or integrated fluorescence intensity of a through-focus series of a thin standardized uniform fluorescent or calibration layer is shown to be suitable for image intensity correction and calibration in sectioning microscopy. This integrated intensity can be derived from the earlier introduced SectionedlmagingProperty or SIPcharts,1 derived from the 3D layer datasets. By correcting the 3D image of an object with the 3D image of the standardized uniform fluorescent layer obtained under identical conditions one is able to express the object fluorescence in units fluorescence of the calibration layer. With object fluorescence intensities in 'fluorescence layer unit's or FLU's the object image intensities becomes independent of microscope system and imaging conditions. A direct result is that the often-appreciable lateral intensity variations present in confocal microscopy are eliminated (shading correction). Of more general value is that images obtained with different objectives, magnifications or from different microscope systems can be quantitatively related to each other. The effectiveness of shading correction and relating images obtained under various microscope conditions is demonstrated on images of standard fluorocent beads. Expressing the object fluorescence in FLU units seems to be a promising approach for general quantification of sectioning imaging enabling cross-correlation of imaging results over time and between imaging systems.
机译:薄的标准化均匀荧光层或校准层的全焦点系列的总或积分荧光强度显示适用于切片显微镜中的图像强度校正和校准。可以从较早引入的SectionedlmagingProperty或SIPcharts [1](从3D图层数据集中获得)中获得这种综合强度。通过用在相同条件下获得的标准化均匀荧光层的3D图像校正对象的3D图像,可以以校准层的荧光单位表示对象荧光。随着“荧光层单位”或FLU中物体荧光强度的提高,物体图像强度变得与显微镜系统和成像条件无关。直接结果是消除了共聚焦显微镜中经常出现的横向强度变化(阴影校正)。更普遍的价值是,具有不同物镜,放大倍数或来自不同显微镜系统的图像可以相互定量关联。在标准荧光珠的图像上证明了在各种显微镜条件下获得的阴影校正和相关图像的有效性。以FLU单位表达目标荧光似乎是一种可行的方法,可用于对切片成像进行总体量化,从而实现随时间推移以及成像系统之间成像结果的互相关。

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