MECHANISTIC STUDY OF DIELECTRIC CHEMICAL MECHANICAL POLISHING BY SPECTRAL AND SCALING ANALYSIS OF ATOMIC FORCE MICROSCOPE IMAGES

摘要

Thermal oxide and PETEOS oxide surfaces, polished on an IPEC 472 with different combinations of polish pad, slurry, and polishing conditions, were studied with ex situ atomic force microscopy. The post polish surfaces were analyzed qualitatively by visual inspection and quantitatively by spectral and scaling analyses. Spectral and scaling analyses gave consistent interpretations of morphology evolution. Polishing with either a fixed abrasive pad or alumina-based slurry occurred via a mechanism for which asperities are removed and recesses are filled. A sputtering-type mechanism may have contributed to material removal when polishing with silica- or ceria-based slurries.