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Improved Air-stability of n-Channel Organic Thin Film Transistors via Surface Modification on Gate Dielectrics

机译:通过栅极电介质的表面改性改善了n沟道有机薄膜晶体管的空气稳定性

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摘要

The air-stability of n-channel organic thin film transistors (OTFTs) has been improved by modifying the dielectric surfaces with polymer insulators. The OTFTs were fabricated using N,N'-dioctyl-3,4,9,10-perylene tetracarboxylic diimide (PTCDI-C8) as the active material and SiO_2 modified with different polymers as the gate dielectric. Among the polymer insulators, the device modified with hydroxyl-free polymers exhibited the best performance. For example, the electron mobility, 0.11 cmVVs, in the saturation region, was obtained in the ambient condition for the device with the SiO_2 surface modified with the polymers. The on-off ratio was also as high as 10~5. More importantly, the devices modified with hydroxyl-free polymers had better air-stability. The improved stability could be attributed to the passivation of the hydroxyl groups (electron trapping sites) on the SiO_2 surface.
机译:n沟道有机薄膜晶体管(OTFT)的空气稳定性已通过使用聚合物绝缘体修改介电表面得到改善。使用N,N'-二辛基-3,4,9,10-per四羧酸二酰亚胺(PTCDI-C8)作为活性材料,并使用不同聚合物改性的SiO_2作为栅极电介质来制造OTFT。在聚合物绝缘子中,用无羟基聚合物改性的器件表现出最佳性能。例如,在环境条件下,对于用聚合物改性的SiO_2表面的器件,在饱和区域中获得的电子迁移率为0.11 cmVVs。开关比也高达10〜5。更重要的是,用无羟基聚合物改性的器件具有更好的空气稳定性。改善的稳定性可以归因于SiO_2表面上的羟基(电子捕获位点)的钝化。

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  • 来源
    《Thin Film Transistors 9 (TFT 9)》|2008年|253-260|共8页
  • 会议地点 Honolulu HI(US)
  • 作者单位

    Department of Photonics, National Chiao Tung University, Hsinchu 300, Taiwan Display Institute, National Chiao Tung University, Hsinchu 300, Taiwan;

    Department of Photonics, National Chiao Tung University, Hsinchu 300, Taiwan Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan;

    AU Optronics Corp., Hsinchu 300, Taiwan;

    AU Optronics Corp., Hsinchu 300, Taiwan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 表面处理;
  • 关键词

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