Korea Institute of Industrial Technology, 1110-9 Oryong-dong, Buk-ku, Gwangju, Korea 500-480;
Korea Institute of Industrial Technology, 1110-9 Oryong-dong, Buk-ku, Gwangju, Korea 500-480;
Korea Institute of Industrial Technology, 1110-9 Oryong-dong, Buk-ku, Gwangju, Korea 500-480;
Korea Institute of Industrial Technology, 1110-9 Oryong-dong, Buk-ku, Gwangju, Korea 500-480;
Korea Institute of Industrial Technology, 1110-9 Oryong-dong, Buk-ku, Gwangju, Korea 500-480;
CIGS; thin film; RF sputtering; single target;
机译:热处理对RF磁控溅射在室温下制备的CIGS薄膜微观结构和形态的影响
机译:通过射频磁控溅射从单个四元靶制备的CIGS吸收层
机译:通过射频磁控溅射从单个四元靶制备的CIGS吸收层
机译:硫化对单靶射频溅射制备的CIGS薄膜的影响
机译:激光划线铜铟镓五烯化(CIGS)薄膜太阳能电池模块的开发和制作
机译:NIR退火对RF溅射Al掺杂ZnO薄膜特性的影响
机译:用四元靶离子束溅射制备CIGs薄膜的表征