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Thickness Dependent Electrical Properties of Lead Zirconate Titanate Thin Films on Titanium Substrates

机译:钛基底上锆钛酸铅钛薄膜的厚度依赖性电性能

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Ferroelectric lead zirconate titanate Pb(Zr_(0.53)Ti_(0.47))O_3 (PZT) thin films with various thicknesses have been fabricated on Ti substrates by using the sol-gel method with a rapid thermal annealing process (RTA). A thin layer of LaNiO_3 (LNO) thin film was introduced between PZT and Ti substrate. Results indicated that PZT thin films on Ti maintained strong dielectric and ferroelectric properties. With increasing the film thickness, the dielectric constant K of PZT thin films increases, so does the leakage current density. The value of K is of 1050 and 1500 for 0.7 and 2.1 μm thick PZT thin films respectively. The remnant polarization Pr of PZT thin films achieved around 55 μC/cm~2, and the coercive field EC decreased with increasing the film thickness.
机译:采用溶胶-凝胶法和快速热退火工艺(RTA),在钛基片上制备了各种厚度的铁酸锆钛酸铅钛酸盐Pb(Zr_(0.53)Ti_(0.47))O_3(PZT)薄膜。在PZT和Ti衬底之间引入了一层LaNiO_3(LNO)薄膜。结果表明,Ti上的PZT薄膜保持强介电和铁电性能。随着膜厚度的增加,PZT薄膜的介电常数K增加,漏电流密度也增加。对于0.7和2.1μm厚的PZT薄膜,K的值分别为1050和1500。 PZT薄膜的剩余极化Pr达到55μC/ cm〜2左右,矫顽场EC随着膜厚的增加而减小。

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