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New methodology for measuring highly aberrated wavefronts induced by diffractive optical elements

机译:测量衍射光学元件引起的高像差波阵面的新方法

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Abstract: Diffractive optical elements (DOE) have been widely used in both scientific and industrial applications. Optical wavefront measurements are one of the most important methodologies in verifying the performance of DOEs. Due to its non-destructive nature, ease of implementation, and relative short operation time, optical interferometry-based systems for wavefront measurements remain popular. The advantages and drawbacks of a non-common path and common path interferometry technique are examined first within this article.!14
机译:摘要:衍射光学元件(DOE)已广泛用于科学和工业应用。光学波前测量是验证DOE性能的最重要方法之一。由于其无损性质,易于实施以及相对较短的操作时间,用于波前测量的基于光学干涉术的系统仍然很受欢迎。本文首先探讨了非公共路径和公共路径干涉测量技术的优缺点。14

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