New methodology for measuring highly aberrated wavefronts induced by diffractive optical elements

摘要

Diffractive optical elements (DOE) have been widely used in both scientific and industrial applications. Optical wavefront measurements are one of the most important methodologies in verifying the performance of DOEs. Due to its non-destructive nature, ease of implementation, and relative short operation time, optical interferometry-based systems for wavefront measurements remain popular. The advantages and drawbacks of a non-common path and common path interferometry technique are examined first within this article.