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Evaluation on Structure and Tribological Properties of Carbon Nitride Films Deposited on YG8 Carbide Alloy Substrates

机译:YG8硬质合金基体上沉积氮化碳膜的结构和摩擦学性能评估

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摘要

CNx films were deposited on YG8 carbide alloy (WC+8%Co) substrates by DC or RF magnetron sputtering. The composition, bonding state, adhesion, and tribological behavior of CNx films were researched. X-ray Photoelectron spectroscopy results showed that C-N, C=N and C=N bond existed in CNx films. RF magnetron sputtering is in favor of the bonding of C and N, the adhesion and the wear resistance of CNx films. DC magnetron sputtering is in favor of lubricating ability of CNx films. Substrate bias has some effect on the bonding of C and N, the adhesion of the films, decrease of adhesive wear and the friction coefficient of films.
机译:通过DC或RF磁控溅射将CNx膜沉积在YG8碳化物合金(WC + 8%Co)衬底上。研究了CNx薄膜的组成,结合状态,附着力和摩擦学行为。 X射线光电子能谱分析结果表明,CNx薄膜中存在C-N,C = N和C = N键。 RF磁控溅射有利于C和N的键合,CNx膜的附着力和耐磨性。直流磁控溅射有利于CNx膜的润滑能力。基材偏压对C和N的键合,薄膜的粘附性,粘合剂的磨损减少和薄膜的摩擦系数有一定影响。

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