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Terahertz emission from narrow band gap semiconductors

机译:窄带隙半导体的太赫兹发射

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We report an experimental study on THz-emission from narrow band gap semiconductors excited by femtosecond nearinfrared laser pulses. In particular, we studied GaSb, Ga_(1-x)In_xSb and InN. The Ga_(1-x)In_xSb material system enables the study of the influence of carrier concentrations on THz emission process in narrow band gap semiconductors. The study demonstrates the existence of a compromise between the positive effect of high electron temperature provided by narrow band gap materials and the negative effect of high intrinsic carrier concentrations. The influence of the majority and minority carrier types and concentrations on THz emission strength was investigated using GaSb:Te. By varying the majority and minority carrier type and carrier concentrations over three orders of magnitude the THz emission mechanism in GaSb can be tuned from being dominated by the photo-Dember effect to being dominated by surface field acceleration. Within each regime photo-Dember based THz emission and surface field acceleration based THz emission are maximized under specific majority and minority carrier concentrations. Strong advantages of InN as THz-emitter over other narrow band gap materials, are strong intrinsic electric fields, low intrinsic carrier concentration and most importantly, very low probability of intervalley scattering.
机译:我们报告了由飞秒近红外激光脉冲激发的窄带隙半导体的太赫兹发射的实验研究。特别是,我们研究了GaSb,Ga_(1-x)In_xSb和InN。 Ga_(1-x)In_xSb材料系统能够研究载流子浓度对窄带隙半导体中THz发射过程的影响。研究表明,在窄带隙材料提供的高电子温度的正效应与高固有载流子浓度的负效应之间存在折衷方案。使用GaSb:Te研究了大多数和少数载流子类型和浓度对THz发射强度的影响。通过在三个数量级上改变多数和少数载流子类型和载流子浓度,可以将GaSb中的THz发射机理从受光-登伯效应控制变为由表面场加速控制。在每个方案中,基于光-木贝的THz发射和基于表面场加速的THz发射在特定的多数和少数载流子浓度下都达到最大。与其他窄带隙材料相比,InN作为THz发射极的强大优势在于其强大的固有电场,较低的固有载流子浓度以及最重要的是,极低的intervalley散射概率。

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