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High density semiconductor nanodots by direct laser fabrication

机译:直接激光制造高密度半导体纳米点

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We report a direct method of fabricating high density nanodots on the GaAs(001) surfaces using laser irradiations on the surface. Surface images indicate that the large clumps are not accompanied with the formation of nanodots even though its density is higher than the critical density above which detrimental large clumps begin to show up in the conventional Stranski-Krastanov growth technique. Atomic force microscopy is used to image the GaAs(001) surfaces that are irradiated by high power laser pulses interferentially. The analysis suggests that high density quantum dots be fabricated directly on semiconductor surfaces.
机译:我们报告了在表面上使用激光辐照在GaAs(001)表面上制造高密度纳米点的直接方法。表面图像表明,即使大的团块的密度高于临界密度,在常规Stranski-Krastanov生长技术中开始出现有害的大团块时,大团块也不伴随纳米点的形成。原子力显微镜用于对高功率激光脉冲干扰地照射的GaAs(001)表面成像。分析表明,高密度量子点可直接在半导体表面上制造。

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