首页> 外文会议>Symposium on Self-Organized Processes in Semiconductor Alloys held November 29-December 2, 1999, Boston, Massachusetts, U.S.A. >The nature and origin on lateral composition modulations in short-period strained-layer superlattices
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The nature and origin on lateral composition modulations in short-period strained-layer superlattices

机译:短周期应变层超晶格横向成分调制的性质和起源

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The nature and origin of lateral composition modulations in (AlAs)_m(InAs)_n short-period strained-layer superlattices grown by molecular beam epitaxy on InP substrates have been investigated by x-ray diffraction, atomic force microscopy, and transmission electron microscopy. Strong modulations were observed for growth temperatures between approx approx 540 and 560 deg C. The maximum strength of modulations was found for SPS samples with InAs mole fraction x (=n/(n+m)) close to approx approx 0.50 and when n approx approx m approx approx 2. The modulations were suppressed at both high and low values of x. For x > 0.52 (global compression), the modulations were along the <100> directions in the (001) growth plane. For x < 0.52 (global tension), the modulations were along the two <310> directions rotated approx approx +-27deg from [110] in the growth plane. The remarkably constant wavelength of the modulations, between approx approx 20-30 nm, and the different modulation directions observed, suggest that the origin of the modulations is due to surface roughening associated with the high misfit between the individual SPS layers and the InP substrate. Highly uniform unidirectional modulations have been grown by control of the InAs mole fraction and growth on suitably offcut substrates, which show great promise for application in device structures.
机译:通过X射线衍射,原子力显微镜和透射电子显微镜研究了分子束外延在InP衬底上生长的(AlAs)_m(InAs)_n短周期应变层超晶格中横向成分调制的性质和起源。在大约540到560摄氏度之间的生长温度下观察到强调制。对于InAs摩尔分数x(= n /(n + m))接近于大约0.50的SPS样品,发现了最大的调制强度,当n大约为0时。大约m大约2。在x的高值和低值处均抑制了调制。对于x> 0.52(全局压缩),调制沿(001)生长平面中的<100>方向进行。对于x <0.52(全局张力),调制沿两个<310>方向在生长平面中从[110]旋转大约+ -27度。调制的波长非常恒定,大约在20-30 nm之间,并且观察到不同的调制方向,这表明调制的起源是由于与各个SPS层和InP基板之间的高度失配相关的表面粗糙。通过控制InAs摩尔分数并在适当切入的衬底上生长,已经生长出高度均匀的单向调制,这显示出在器件结构中的应用前景广阔。

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