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SUB_200 Oe giant magnetoresistance in manganite tunnel junctions

机译:SUB_200锰矿隧道结中的Oe巨磁致电阻

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Metallic manganite oxides, La_(1-x)D_xMnO_3 (D chemical bounds Sr, Ca, etc.), display "colossal" magnetoresistance (CMR) near their magnetic phase transition temperatures (T_c) when subject to a Tesla-scale magnetic field. This phenomenal effect is the result of the strong interplay inherent in this class of materials among electronic structure, magnetic ordering, and lattice dynamics. Though fundamentally interesting, the CMR effect achiev ed only at large fields posses severe technological challenges to potential applications in magnetoelectronic devices, where low field sensitivity is crucial. Among the objectives of our research effort involvinb manganite materials is to reduce the field scale of MR by designing and fabricating tunnel junctions and other structures rich in magnetic domain walls. the junction electrodes were jmade of doped manganite epitaxial films, and the insulating barrier of SrTiO_3. The interfacial expitaxy has been imaged by using high-resolution transmission electron microscopy (TEM). We have used self-aligned lithographic process to pattern the junctions to micron scale in size. Large MR values close to 250
机译:金属锰氧化物La_(1-x)D_xMnO_3(D化学界Sr,Ca等)在经受特斯拉规模的磁场时,在其磁相变温度(T_c)附近显示“巨大”磁阻(CMR)。这种惊人的效果是此类材料在电子结构,磁序和晶格动力学之间固有的强大相互作用的结果。尽管从根本上讲令人感兴趣,但仅在大磁场下才能实现的CMR效应对磁电子器件的潜在应用提出了严峻的技术挑战,在这些应用中,低磁场灵敏度至关重要。我们研究工作涉及的目标之一是通过设计和制造隧道结和其他富含磁畴壁的结构来减少MR的磁场规模。结电极由掺杂的锰外延膜和SrTiO_3的绝缘层组成。通过使用高分辨率透射电子显微镜(TEM)对界面的饱和度进行了成像。我们使用了自对准光刻工艺将结图案化为微米级。大MR值接近250

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