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TShin film growth and magnetotransport study of (La, Sr)MnO_3

机译:(La,Sr)MnO_3的TShin膜生长和磁输运研究

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Thin-film smples of la_(1-x)Sr_xMnO_3(x chemical bouns 0.20-0.30) were grown by pulsed-laser deposition using various target compositions, substrate materials, growth temperatures, oxygen partial pressures, and laser-pulse repetition rates. The crystal structure and the transport and magnetic properties of these films were then examined. Of the growth conditions, the oxygen partial pressure (Po_2_ had the greatest influence on the electrical and magnetic properties. Films grown under a low Po_2 had a low ferromagnetic transition temperature (T_c) and a wide resistive transition width. None of the heat treatments doen after growth improved these films' quality. The films morphology was significantly affected by the substrate material. Our x-ray diffraction analysis and AFM measurements revealed that the films deposited on both MgO (100) and LaAlO_3 (100) were epitaxially grown but contained defect structures. In contrast, grain-free thin films were epitaxially grown npn the SrTiO_3 (100) substrates. The surface roughness of films grown on SrTiO_3 was less tan 0.3 nm, enven for films up to 150 nm thick. Under optimized growth conditions, as0deosited films for x=>0.2 showed a sharp transition in resistivity at T-C. magnetoresistance at far below T_c was as low as that reorted for single-crystal sample. Since large magnetoresistance was often observed in polycrystalline samples and believed to be a grain boundary effect, these results indicate the high quality of the films grown on the SrTiO_3 substrates.
机译:la_(1-x)Sr_xMnO_3(x化学键0.20-0.30)的薄膜样品通过脉冲激光沉积使用各种靶材组成,基板材料,生长温度,氧分压和激光脉冲重复率来生长。然后检查了这些膜的晶体结构以及传输和磁性。在生长条件中,氧分压(Po_2_对电和磁性能的影响最大。在低Po_2下生长的膜具有较低的铁磁转变温度(T_c)和宽的电阻转变宽度。生长后提高了这些薄膜的质量,薄膜的形貌受基材的影响很大,我们的X射线衍射分析和原子力显微镜测量表明,沉积在MgO(100)和LaAlO_3(100)上的薄膜都是外延生长的,但存在缺陷相比之下,在SrTiO_3(100)衬底上外延生长了无晶粒薄膜,在SrTiO_3上生长的薄膜的表面粗糙度小于0.3 nm,这对于厚度达150 nm的薄膜而言是理想的。 x => 0.2的薄膜在TC处显示出电阻率的急剧变化,远低于T_c的磁阻与单晶样品的电阻率一样低。在多晶样品中经常观察到电阻,并认为是晶界效应,这些结果表明在SrTiO_3衬底上生长的薄膜质量很高。

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