首页> 外文会议>Symposium on Properties and Processing of Vapor-Deposited Coatings held November 30-December 2, 1998, Boston, Massachusetts, U.S.A. >Property and processing comparison of optical coatings made by ion assisted evaporation and magentron sputtering
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Property and processing comparison of optical coatings made by ion assisted evaporation and magentron sputtering

机译:离子辅助蒸发和磁控溅射制备光学涂层的性能及工艺比较

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摘要

Ion Assisted Evaportation and Magnetron SPuttering are the two most important Physical Vapor Depositioon processes used for optical coatings today. Each has advantages and limitations, and each is best for different coating applications. This paper provides a brief but comprehensive comparison of the two. Starting with introductory process descriptions, the paper, compares Ion Assist and SPuttering feature-by-feature and ranks them is scorecard fashion. Features examined include: adatom energetics, reactivity, materials compatibility, thickness uniformity, deposition rate, substrate te,mperature, durability, environmental stability, refractive indices, absorption, scatter, mechanical stress control, and scalability (chamber and substrate size). The comparison is illustrated with examples from the author's twenty-four years of optical coating experience at three companies, with more than forty coating chambers (small, medium and very large), in research, development and production coating environments.
机译:离子辅助蒸发和磁控溅射是当今用于光学涂层的两个最重要的物理气相沉积工艺。每种都有优点和局限性,并且每种都最适合不同的涂料应用。本文对两者进行了简要而全面的比较。从介绍性的过程描述开始,本文逐个功能比较了离子辅助和溅射功能,并以记分卡形式对其进行了排名。所检查的特征包括:吸附原子的能量,反应性,材料相容性,厚度均匀性,沉积速率,基底温度,性能,耐久性,环境稳定性,折射率,吸收率,散射,机械应力控制和可扩展性(腔室和基底尺寸)。通过作者在三家公司二十四年的光学镀膜经验中举例说明了这一比较,该公司在研究,开发和生产镀膜环境中拥有40多个镀膜室(小,中和非常大)。

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