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Photostimulated Changes of Electrical Characteristics of Ag/CdTe Thin Film Structures

机译:Ag / CdTe薄膜结构电学特性的光刺激变化

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摘要

Electrical, optical and structural properties of Ag/CdTe structures exposed to thermal (in dark) and photoannealing (under illumination) have been studied. The effective diffusion coefficient of Ag in CdTe films have been estimated from resistance versus duration of annealing curves. In the range of 280-420℃ the effective coefficient of thermal diffusion (D_t) and photodiffusion (D_(ph)) are described as D_t=1.9x10~5exp (-1.60/kT) and D_(ph)=8.7x10~3exp(-1.36/kT). The acceleration of Ag diffusion under illumination was tentatively attributed to photoionization of Ag increasing the interstitial flux of silver. Ag/CdTe structures exposed to annealing were characterized by X-ray diffraction (XRD), Ⅰ-Ⅴ, C-V, conductivity-temperature and optical transmission measurements. In XRD patterns of annealed Ag/CdTe structures, besides the intensive (111) peak of cubic CdTe, the weak peaks of Ag_2Te phase are also present. The temperature dependence of conductivity of annealed Ag/CdTe structures showed the energy levels 0.13eV.
机译:已经研究了暴露于热(在黑暗中)和光退火(在照明下)的Ag / CdTe结构的电,光学和结构特性。从电阻对退火曲线的持续时间可以估算出Ag在CdTe薄膜中的有效扩散系数。在280-420℃范围内,有效热扩散系数(D_t)和光扩散系数(D_(ph))描述为D_t = 1.9x10〜5exp(-1.60 / kT)和D_(ph)= 8.7x10〜3exp (-1.36 / kT)。照明下银扩散的加速暂时归因于银的光电离增加了银的间隙通量。通过X射线衍射(XRD),Ⅰ-Ⅴ,C-V,电导率-温度和光透射率测量,表征了暴露于退火的Ag / CdTe结构。在退火的Ag / CdTe结构的XRD图谱中,除了立方CdTe的密集(111)峰外,还存在Ag_2Te相的弱峰。 Ag / CdTe退火结构的电导率与温度的关系显示能级为0.13eV。

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