首页> 外文会议>Symposium Proceedings vol.832; Symposium on Group-IV Semiconductor Nanostructures; 20041129-1202; Boston,MA(US) >Theory of large-scale electronic structure calculation and nanostructures formed in silicon cleavage simulation: surface reconstruction, step and bending
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Theory of large-scale electronic structure calculation and nanostructures formed in silicon cleavage simulation: surface reconstruction, step and bending

机译:大规模电子结构计算理论和硅分裂模拟中形成的纳米结构:表面重建,台阶和弯曲

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Several methodologies are developed for large-scale atomistic simulations with fully quantum mechanical description of electron systems. The important methodological concepts are (ⅰ) generalized Wannier state and (ⅱ) Krylov subspace. Test calculations are done with upto 10~6 atoms using a standard workstation. As a practical nanoscale calculation, the 10 nm scale structure in cleavage process of silicon is investigated. Discussions are focused mainly on the stable (experimentally observed) (111)-(2 x 1) cleavage process. Surface reconstruction and step formation are observed and compared with experiments. These processes are analyzed by the quantum mechanical freedoms of electron system, such as the local density of states (LDOS). We also observed the bending of cleavage plane into the (111) plane from other planes, which is a direct evidence of the stability of the (111) cleavage mode. Finally, several common aspects between cleavage and other phenomena are discussed from a. general viewpoint of 10 nm scale structure.
机译:开发了几种方法用于大规模原子模拟,并具有对电子系统的完整量子力学描述。重要的方法学概念是(ⅰ)广义Wannier态和(ⅱ)Krylov子空间。使用标准工作站最多可以进行10〜6个原子的测试计算。作为实用的纳米尺度计算,研究了硅裂解过程中的10 nm尺度结构。讨论主要集中在稳定的(实验观察到的)(111)-(2 x 1)裂解过程上。观察表面重建和台阶形成并将其与实验进行比较。这些过程通过电子系统的量子力学自由度进行分析,例如状态局部密度(LDOS)。我们还观察到分裂平面从其他平面弯曲到(111)平面,这是(111)分裂模式稳定性的直接证据。最后,讨论了分裂和其他现象之间的几个共同方面。 10 nm尺度结构的一般观点。

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