首页> 外文会议>Symposium Proceedings vol.831; Symposium on GaN, AIN, InN and Their Alloys; 20041129-1203; Boston,MA(US) >Vapor-liquid-solid Growth of III-Nitride Nanowires and Heterostructures by Metal-Organic Chemical Vapor Deposition
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Vapor-liquid-solid Growth of III-Nitride Nanowires and Heterostructures by Metal-Organic Chemical Vapor Deposition

机译:金属有机化学气相沉积法制备III族氮化物纳米线的汽-液-固生长及异质结构

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摘要

We report flexible synthesis of III-Nitride nanowires and heterostructures by metal-organic chemical vapor deposition (MOCVD) via a catalytic vapor-liquid-solid (VLS) growth mechanism. Indium is used as an in-situ catalyst to facilitate and sustain the stability of liquid phase droplet for VLS growth based on thermodynamic consideration. The employment of mesoporous molecular sieves (MCM-41) helps to prevent the coalescence of catalyst droplets and to promote nucleation statistics. Cathodoluminescence (CL) of GaN nanowires shows near band-edge emission at 370nm, and strong E_2 phonon peak is observed at room temperature in Raman scattering spectra. Both binary GaN and AlN nanowires have been synthesized by MOCVD. Three-dimensional AlN/GaN trunk-branch nanostructures are reported to illustrate the versatility of incorporating the VLS mechanism into MOCVD process.
机译:我们通过金属有机化学气相沉积(MOCVD)通过催化气液固(VLS)的生长机理报告了III型氮化物纳米线和异质结构的灵活合成。基于热力学考虑,铟被用作原位催化剂以促进和维持用于VLS生长的液相液滴的稳定性。介孔分子筛(MCM-41)的使用有助于防止催化剂液滴的聚结并促进成核统计。 GaN纳米线的阴极发光(CL)在370nm处显示近带边发射,并且在室温下在拉曼散射光谱中观察到强E_2声子峰。二元GaN和AlN纳米线均已通过MOCVD合成。据报道,三维AlN / GaN主干分支纳米结构说明了将VLS机制纳入MOCVD工艺的多功能性。

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