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Passive Isolators Based On Barium Ferrite Sputtered Films

机译:基于钡铁氧体溅射膜的无源隔离器

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Ferrites have magnetic properties suitable for electronic applications, especially in the microwave range (circulators and isolators). Hexagonal ferrite, such as barium ferrite (BaFe_(12)O_(19) or BaM), are of great interest for microwave device applications because of their large resistivity and high permeability at high frequencies. This contribution focuses on BaM films, 1 to 10 microns thick, which were deposited under optimized conditions by RF magnetron sputtering on alumina or silicon substrates. In order to crystallize the films that were amorphous after deposition, a post deposition annealing at 800℃ was implemented. Optimized samples presented a good crystallization, a smooth surface and no cracks. The films were either randomly oriented or showed slight preferential orientations among the crystallographic planes (101), (200), (206), (102), (110) and (205) when the substrates were heated up to 400℃ during the deposition. Ba, Fe and O depth profiles obtained by Secondary Ion Mass Spectroscopy (SIMS) showed that the films have a good in-depth uniformity. The magnetic properties of BaM films determined by VSM, showed that the optimized coercive force and the saturation magnetization reached 330 kA/m and about 500 mT respectively. These values are closed to that of the bulk BaM. Isolators were then realized using patterning of coplanar metallic lines with standard lift-off technique. The slots and the central width were set to 300 μm gold was used for the lines. First results on transmission coefficients showed a non reciprocal effect, which reaches 3.3 dB/cm at 50 GHz. This proved that such a component behaves like an isolator in the 50 GHz band.
机译:铁氧体具有适合电子应用的磁性能,尤其是在微波范围内(循环器和隔离器)。六方铁氧体,例如钡铁氧体(BaFe_(12)O_(19)或BaM),由于在微波中具有高电阻率和高磁导率,因此在微波设备应用中引起了极大的兴趣。该贡献集中于1至10微米厚的BaM膜,这些膜是在最佳条件下通过RF磁控溅射在氧化铝或硅基底上沉积的。为了使沉积后的非晶膜结晶,在800℃下进行了沉积后退火。经过优化的样品具有良好的结晶度,光滑的表面且无裂纹。当在沉积过程中将基板加热到400℃时,薄膜要么随机取向,要么在晶体学平面(101),(200),(206),(102),(110)和(205)中显示出轻微的优先取向。通过二次离子质谱(SIMS)获得的Ba,Fe和O深度分布图表明,薄膜具有良好的深度均匀性。通过VSM测得的BaM薄膜的磁性能表明,优化的矫顽力和饱和磁化强度分别达到330 kA / m和约500 mT。这些值接近批量BaM的值。然后通过使用标准剥离技术对共面金属线进行构图来实现隔离器。槽和中心宽度设置为300μm,金用于生产线。传输系数的最初结果显示出不可逆的影响,在50 GHz时达到3.3 dB / cm。这证明了这种组件在50 GHz频带中的行为就像隔离器。

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