机译:磁控溅射在Pt包覆的Si衬底上高取向M型钡铁氧体薄膜的磁和自偏置特性
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
机译:带式浇铸取向M型钡铁氧体厚膜的织构和自偏压性能
机译:适用于微波应用的Pt涂层Si衬底上的射频磁控溅射沉积六铁酸钡薄膜
机译:厚(≥10μm)磁控溅射钡铁氧体薄膜的微观结构和磁性
机译:射频磁控溅射沉积M型六方钡铁薄膜的磁性和微观结构
机译:溅射钡铁氧体磁性薄膜的制备与表征
机译:射频磁控溅射制备铁氧体石榴石(BiLuY)3(FeGa)5O12薄膜材料的性能
机译:磁控溅射与电感耦合等离子体辅助磁控溅射对纸基板上Cu膜性能的影响。电感耦合等离子体辅助