首页> 外文会议>Symposium on Ion Beam Synthesis and Processing of Advanced Materials held Nov 27-29, 2000, Boston, Massachusetts, U.S.A. >Effect of Substrate Materials on Mechanical Properties and Microstructure of Carbon Nitride Films Prepared by Ion-beam-assistcd deposition
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Effect of Substrate Materials on Mechanical Properties and Microstructure of Carbon Nitride Films Prepared by Ion-beam-assistcd deposition

机译:基板材料对离子束辅助沉积氮化碳薄膜力学性能和微观结构的影响

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Carbon nitride (C-N) thin films were prepared on several substrates by ion-bcam-assisted deposition technique. In this experiment, carbon was evaporated by electron beam. Nitrogen and argon ion beams were bombarded simultaneously. Aluminum alloy (7075), high-carbon chrome bearing steel (SUJ2), pure titanium plates (99.5%) and Si(100) wafer were used as substrates. Here, mechanical properties, such as hardness, adhesion, friction coefficient and wear resistance were investigated. These results show the adhesion between the films and substrates were improved by formation of the carbon layer. The microstructure of the carbon nitride films were investigated by cross sectional high-resolution transmission electron microscopy (HRTEM).
机译:氮化碳(C-N)薄膜是通过离子bcam辅助沉积技术在几个基板上制备的。在该实验中,碳通过电子束蒸发。同时轰炸氮气和氩离子束。铝合金(7075),高碳铬轴承钢(SUJ2),纯钛板(99.5%)和Si(100)晶片用作基材。在此,研究了机械性能,例如硬度,粘附性,摩擦系数和耐磨性。这些结果表明通过形成碳层改善了膜与基底之间的粘附性。通过截面高分辨率透射电子显微镜(HRTEM)研究了氮化碳膜的微观结构。

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