首页> 外文会议>Symposium on High-Pressure Materials Research held December 1-4, 1997, Boston, Massachusetts, U.S.A. >A study of band alignment in GaAs/GaInP(partially ordered) heterostructures with high pressure
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A study of band alignment in GaAs/GaInP(partially ordered) heterostructures with high pressure

机译:GaAs / GaInP(部分有序)异质结构在高压下的能带排列研究

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In this paper we review the use of high pressure techniques to investigate the optical properties of partially ordered GaInP epitaxial layers grown on GaAs substrates. In particular, we demonstrate the ability of high pressure to modify the band alignment at the GaInP/GaAs interface and hence to alter the optical properties of heterostructures fabricated from partially ordered GaInP on GaAs.
机译:在本文中,我们回顾了高压技术的使用,以研究在GaAs衬底上生长的部分有序GaInP外延层的光学特性。特别地,我们证明了高压能够改变GaInP / GaAs界面处的能带排列,从而改变由GaAs上的部分有序GaInP制成的异质结构的光学性质。

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