首页> 外文会议>Symposium on GaN and Related Alloys―2001, Nov 26-30, 2001, Boston, Massachusetts, U.S.A. >Impact of In content on the structural and optical properties of (In,Ga)N/GaN multiple quantum wells grown by plasma-assisted molecular beam epitaxy
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Impact of In content on the structural and optical properties of (In,Ga)N/GaN multiple quantum wells grown by plasma-assisted molecular beam epitaxy

机译:In含量对等离子辅助分子束外延生长(In,Ga)N / GaN多量子阱结构和光学性质的影响

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We have studied the structural and optical properties of a series of (In,Ga)/GaN multiple quantum wells with identical thicknesses but varied In content grown by plasma-assisted molecular beam epitaxy. Careful choice of the growth parameters returns samples with smooth and abrupt interfaces. The shift of the photoluminescence transition energy with externally applied biaxial tension was investigated. We observed a red-shift for small In contents while a blue-shift was detected for higher In contents. This result is in qualitative agreement with band profile calculations taking into account both the band gap deformation potentials and the piezoelectric polarization in these structures. However, the magnitude of the shift is well in excess of the calculated one. We attribute this finding to a substantial deviation of the piezoelectric constants from those calculated for unstrained material. Finally, we estimate the piezoelectric polarization of InGaN/GaN for linear and non-linear terms in strain.
机译:我们已经研究了一系列(In,Ga)/ GaN多量子阱的结构和光学性质,这些阱具有相同的厚度,但是通过等离子体辅助分子束外延生长的In含量变化。仔细选择生长参数可返回具有平滑和突变界面的样品。研究了光致发光跃迁能量随外部施加的双轴张力的变化。我们观察到少量In含量发生红移,而检测到较高In含量发生蓝移。考虑到这些结构中的带隙变形电势和压电极化,该结果与带轮廓计算在质量上一致。但是,位移的幅度远远超过计算得出的幅度。我们将这一发现归因于压电常数与未应变材料计算所得的压电常数存在较大偏差。最后,我们估算了应变中线性和非线性项的InGaN / GaN的压电极化。

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