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SCALING ANALYSIS OF ROUGHNESS DURING SILVER ELECTRODEPOSITION

机译:银电镀过程中粗糙度的标度分析

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This work represents the first time that scaling analysis has been used to study silver electrodeposition from sodium and ammonium thiosulfate solutions. Empirical observations of silver plated from these solutions indicates that the plate made from sodium thiosulfate solution is macroscopically smoother than that plated from ammonium thiosulfate solution. Using scaling analysis, differences were found in the mechanism of silver electrodeposition that explains the differences. Silver electrodeposition from ammonium thiosulfate solution is dominated by surface diffusion and step growth, and from sodium thiosulfate solution the surface growth is dominated by erosion of asperities and filling in of surface recesses. Atomic Force Microscope (AFM) images of the surfaces confirmed the scaling analysis results.
机译:这项工作是首次使用结垢分析来研究硫代硫酸钠和硫代硫酸铵溶液中的银电沉积。从这些溶液镀银的经验观察表明,由硫代硫酸钠溶液制成的板在宏观上比由硫代硫酸铵溶液制成的板更光滑。使用定标分析,发现在电沉积银机理上的差异可以解释这些差异。来自硫代硫酸铵溶液的银电沉积主要受表面扩散和台阶生长的影响,而来自硫代硫酸钠溶液的表面生长主要受粗糙表面的腐蚀和表面凹坑的填充的影响。表面的原子力显微镜(AFM)图像确认了结垢分析结果。

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