首页> 外文会议>Symposium on Defect and Impurity Engineered Semiconductors and Devices III, Apr 1-5, 2002, San Francisco, California >An Study of Influence of Imperfections on the Delamination of Diamond-Like Carbon Films
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An Study of Influence of Imperfections on the Delamination of Diamond-Like Carbon Films

机译:缺陷对类金刚石碳膜分层影响的研究

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The role of imperfections on the initiation and propagation of interface delaminations in compressed thin films has been analyzed using experiments with diamond-like carbon (DLC) films deposited onto glass substrates. The surface topologies and interface separations have been characterized by using the Atomic Force Microscope (AFM) and the Focused Ion Beam (FIB) imaging system. The lengths and amplitudes of numerous imperfections have been measured bv AFM and the interface separations characterized on cross sections made with the FIB. Chemical analysis of several sites, performed using Auger Electron Spectroscopy (AES), has revealed the origin of the imperfections. The incidence of buckles has been correlated with the imperfection length.
机译:使用沉积在玻璃基板上的类金刚石碳(DLC)膜进行的实验分析了缺陷对压缩薄膜中界面分层的引发和传播的作用。通过使用原子力显微镜(AFM)和聚焦离子束(FIB)成像系统来表征表面拓扑和界面分离。已通过AFM测量了许多缺陷的长度和幅度,并以FIB制成的横截面表征了界面间距。使用俄歇电子能谱(AES)对几个位置进行化学分析,发现了缺陷的起源。扣的发生率与缺陷长度有关。

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