Remote microwave plasma-enhanced chemical vapour deposition of insulating coatings (SiO_2) on metallic substrates: film properties

机译：远程微波等离子体增强金属基底上绝缘涂层（SiO_2）的化学气相沉积：薄膜性能

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Silicon dioxide thin films were prepared on stainless steel substrates by remote microwave plasma-enhanced chemical vapour deposition (RMPECVD) using an oxygen plasma and a mixture of 5

机译：使用氧等离子体和5的混合物通过远程微波等离子体增强化学气相沉积（RMPECVD）在不锈钢基板上制备二氧化硅薄膜

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《Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation, Symposium C on Pushing the Limits of Ion Beam Processing-From Engineering to Atomic Scale Issues, And Symposium H on Advanced Deposition Processes and Character》|1995年|p.18-22|共5页
会议地点 Strasbourg(FR);Strasbourg(FR);Strasbourg(FR)
作者
C.Regnier; P.Tristant; J.Desmaison;
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原文格式 PDF
正文语种 eng
中图分类一般工业技术;
关键词
microwave; PECVD; remote; silica;

机译：微波; PECVD;远程;二氧化硅;

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专利

1. Preparation of Device-quality SiO_2 Thin Films by Remote Plasma-enhanced Chemical Vapour Deposition (PECVD): Applications in Metal-Oxide-Semiconductor (MOS) Devices [J] . Gerald Lucovsky Advanced Materials for Optics and Electronics . 1996,第2期

机译：通过远程等离子体增强化学气相沉积（PECVD）制备器件质量的SiO_2薄膜：在金属氧化物半导体（MOS）器件中的应用
2. Porous SiO2 films prepared by remote plasma-enhanced chemical vapour deposition - a novel antireflection coating technology for photovoltaic modules [J] . Nagel H., Hezel R., Metz A. Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2001,第1a4期

机译：通过远程等离子增强化学气相沉积制备的多孔SiO2膜-一种用于光伏模块的新型抗反射涂层技术
3. Remote Microwave Plasma Enhanced Chemical Vapour Deposition of SiO_2 Films: Oxygen Plasma Diagnostic [J] . C. Regnier, J. Desmaison, P. Tristant, Journal de Physique, IV: Proceedings of International Conference . 1995,第5aPta2期

机译：远程微波等离子体增强SiO_2薄膜的化学气相沉积：氧等离子体诊断
4. Remote microwave plasma-enhanced chemical vapour deposition of insulating coatings (SiO_2) on metallic substrates: film properties [C] . C.Regnier, P.Tristant, J.Desmaison, Symposium J on correlated effects in atomic and cluster ion bombardment and implantation;Symposium C on pushing the limits of ion beam processing - from engineering to atomic scale issues;Symposium H on advanced deposition processes and characterization of protective coatings . 1996

机译：在金属基材上的远程微波等离子体增强的绝缘涂层的化学气相沉积：薄膜性能
5. The deposition of inorganic thin films on polymer substrates by plasma-enhanced chemical vapor deposition. [D] . Guerin, Daniel Christian. 2001

机译：通过等离子增强化学气相沉积在聚合物基材上沉积无机薄膜。
6. Material design of plasma-enhanced chemical vapour deposition SiCH films for low-k cap layers in the further scaling of ultra-large-scale integrated devices-Cu interconnects [O] . Hideharu Shimizu, Shuji Nagano, Akira Uedono, 2013

机译：用于进一步缩小超大型集成器件-Cu互连的等离子增强化学气相沉积SiCH膜的低k覆盖层的材料设计
7. Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films [O] . Blanquet Elisabeth, Mantoux Arnaud, Pons Michel, 2010

机译：非晶态和纳米晶态金属涂层的化学气相沉积和原子层沉积：朝向多金属膜的沉积

Remote microwave plasma-enhanced chemical vapour deposition of insulating coatings (SiO_2) on metallic substrates: film properties

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