Electrochemical behavior of copper in tetramethyl ammonium hydroxide based solutions

摘要

An investigation was undertaken to characterize the electrochemical behavior of copper in tetramethyl ammonium hydroxide (TMAH) based solutions. The effect of hydrogen peroxide and abrason with a polyvinyl alcohol (PVA) brush on the corrosion of copper in alkaline solutions were characterized. Galvanic interactions between copper and tantalum in TMAH as well as in ammonium hydroxide (NH_4OH) solutions were investigated. The experimental results have shown that the corrosion of copper in TMAH is lower than that in NH_4OH, especially at pH values higher than 10. Even in the presence of hydrogen peroxide, TMAH corrodes copper at a lower rate than NH_4OH.